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La[N(TMS)2]3, tris(bis[tri-methylsilyl]amido) lanthanum, CAS# 175923-07-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
2Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition

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Mark Sowa


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