Search 1628 plasma ALD publications by:
tris(bis[trimethylsilyl]amido) lanthanum, La[N(TMS)2]3, CAS# 175923-07-6
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition|
|2||Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition|