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La[N(TMS)2]3, tris(bis[tri-methylsilyl]amido) lanthanum, CAS# 175923-07-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
2Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition

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