Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Where to buy tris(bis[trimethylsilyl]amido) lanthanum, La[N(TMS)2]3 CAS# 175923-07-6

tris(bis[trimethylsilyl]amido) lanthanum, La[N(TMS)2]3 CAS# 175923-07-6 is available from the following source(s):

NumberVendorRegionLink
1Ereztech🇺🇸Tris[N-N-bis(trimethylsilyl)amide] lanthanum(III)
2Pegasus Chemicals🇬🇧Tris[N,N-bis(trimethylsilyl)amide]lanthanum(III)

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