2022 Year in Review

August 2023 Stats


The publication database currently has 1692 entries.
210 Films
283 Precursors
78 Dep Hardware Sets
255 Characteristics
94 Theses
5191 Authors

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2021 Year in Review
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Recent Database Additions
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier Self-limiting diamond growth from alternating CFx and H fluxes Sub-10-nm ferroelectric Gd-doped HfO2 layers

La2O3 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing La2O3 films returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
2Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
3Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
4The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
5Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
6Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
7Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
8Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
9XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
10Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
11Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source

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