La₂O₃ Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing La₂O₃ films returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
2	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
3	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
4	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
5	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
6	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
7	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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