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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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La2O3 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing La2O3 films returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
2Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
3XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
4Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
5Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
6Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
7The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
8Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
9Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
10Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
11Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition