Publication Information

Title: Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source

Type: Journal

Info: Journal of the Korean Physical Society, Vol. 49, No. 3, pp. 1303-1306

Date: 2005-11-22

DOI: http://www.jkps.or.kr/journal/view.html?uid=7961&vmd=Full

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Films

Plasma La2O3 using Custom ECR

Deposition Temperature Range = 150-450C

404009-15-0

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

-

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Substrates

Si(100)

Keywords

Notes

1186



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