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Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 49, No. 3, pp. 1303-1306
Date:
2005-11-22
Author Information
| Name | Institution |
|---|---|
| Beom-Yong Kim | Hanyang University |
| Myoung-Gyun Ko | Hanyang University |
| Eun-Joo Lee | Hanyang University |
| Min-Soo Hong | Hanyang University |
| You-Jin Jeon | Hanyang University |
| Jong-Wan Park | Hanyang University |
Films
Plasma La2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Substrates
| Si(100) |
Notes
| 1186 |