Publication Information

Title:
Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 49, No. 3, pp. 1303-1306
Date:
2005-11-22

Author Information

Name Institution
Beom-Yong KimHanyang University
Myoung-Gyun KoHanyang University
Eun-Joo LeeHanyang University
Min-Soo HongHanyang University
You-Jin JeonHanyang University
Jong-Wan ParkHanyang University

Films

Plasma La2O3

Hardware used: Custom ECR


CAS#: 10028-15-6

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Substrates

Si(100)

Keywords

Notes

1186