Custom ECR Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom ECR hardware returned 10 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
2Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
3Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
4Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
5Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
6Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
7Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
8Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
9Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
10PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases