2022 Year in Review

February 2023 Stats


The publication database currently has 1673 entries.
204 Films
279 Precursors
78 Dep Hardware Sets
253 Characteristics
91 Theses
5136 Authors

Use Advanced Search for more complex searches


2021 Year in Review
ALD Links
Contact Us
LinkedIn Profile

Recent Database Additions
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes

Custom ECR Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom ECR hardware returned 10 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
2Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
3Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
4Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
5Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
6Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
7Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
8Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
9Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
10Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods

© 2014-2023 plasma-ald.com