Your search for plasma enhanced atomic layer deposition publications using Custom ECR hardware returned 5 records. If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy|
|2||Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films|
|3||Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices|
|4||Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods|
|5||Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films|
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