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Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
Type:
Journal
Info:
Thin Solid Films 552 (2014) 155 - 158
Date:
2013-12-04
Author Information
| Name | Institution |
|---|---|
| Dong-Suk Han | Hanyang University |
| Duck-Kyun Choi | Hanyang University |
| Jong-Wan Park | Hanyang University |
Films
Plasma Al2O3
Plasma TiO2
Film/Plasma Properties
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Unknown
Analysis: Bending Test, Four Point Bend Delamination Test
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: OLED Illumination
Substrates
| PES, Poly(Ether Sulfone) |
Notes
| 568 |