Publication Information

Title: Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation

Type: Journal

Info: Thin Solid Films 552 (2014) 155 - 158

Date: 2013-12-04

DOI: http://dx.doi.org/10.1016/j.tsf.2013.12.003

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Films

Plasma Al2O3 using Custom ECR

Deposition Temperature Range = 40-100C

75-24-1

7782-44-7

Plasma TiO2 using Custom ECR

Deposition Temperature Range = 40-100C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Water Vapor Transmission Rate (WVTR)

Water Vapor Transmission Rate (WVTR)

Mocon PERMATRAN-W Model 3/33

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Unknown

Bending Test, Four Point Bend Delamination Test

-

Water Vapor Transmission Rate (WVTR)

OLED Illumination

JBS International IVL300

Substrates

PES, Poly(Ether Sulfone)

Keywords

Diffusion Barrier

Notes

568



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