Publication Information

Title:
Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
Type:
Journal
Info:
Thin Solid Films 552 (2014) 155 - 158
Date:
2013-12-04

Author Information

Name Institution
Dong-Suk HanHanyang University
Duck-Kyun ChoiHanyang University
Jong-Wan ParkHanyang University

Films

Plasma Al2O3



Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Unknown
Analysis: Bending Test, Four Point Bend Delamination Test

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: OLED Illumination

Substrates

PES, Poly(Ether Sulfone)

Keywords

Diffusion Barrier

Notes

568