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Jong-Wan Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jong-Wan Park returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
2Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
3Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
4Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
5Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
6Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
7Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
8Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
9Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
10Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source