Jong-Wan Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jong-Wan Park returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
2Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
3Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
4Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
5Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
6Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
7Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
8Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
9Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
10Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films