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Jong-Wan Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jong-Wan Park returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
2Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
3Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
4Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
5Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
6Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
7Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
8Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
9Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
10Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition