Your search for plasma enhanced atomic layer deposition publications authored by Jong-Wan Park returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation|
|2||Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor|
|3||Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films|
|4||Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films|
|5||Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition|
|6||Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices|
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