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Publication Information

Title: Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition

Type: Journal

Info: Journal of the Korean Physical Society, Vol. 53, No. 4, October 2008, pp. 2123~2128

Date: 2008-10-01

DOI: http://www.kps.or.kr/jkps/abstract_view.asp?articleuid=2E1675C2-07F0-4B8F-95D6-086C4A25D270&globalmenu=3&localmenu=10

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Films

Deposition Temperature = 270C

32992-96-4

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Thermal Stability

Anneal

Unknown

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Physical Electronics PHI 5700 ESCA

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

JEOL 3010

Substrates

Silicon

Keywords

Ruthenium

Thermal Stability

Plasma-Enhanced Atomic Layer Deposition

PEALD Film Development

Notes

15

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