Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)₂, CAS# 32992-96-4

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), contained in 50 ml cylinder for CVD/ALD
2	Strem Chemicals, Inc.	Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), contained in 50 ml cylinder with high temperature valve for CVD/ALD
3	Strem Chemicals, Inc.	Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru)
4	Gelest	Diethylruthenocene

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 32 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2	Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
3	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
4	Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
5	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
6	Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
7	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
8	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
9	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
10	Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
11	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
12	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
13	Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
14	Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
15	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
16	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
17	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
18	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
19	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
20	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
21	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
22	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
23	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
24	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
25	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
26	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
27	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
28	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
29	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
30	Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
31	Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
32	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals

Shortcuts

© 2014-2019 plasma-ald.com