Publication Information

Title:
Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
Type:
Journal
Info:
Applied Physics Letters 89, 093115 (2006)
Date:
2006-07-03

Author Information

Name Institution
Sung-Soo YimSeoul National University
Moon-Sang LeeSeoul National University
Ki-Su KimSeoul National University
Ki-Bum KimSeoul National University

Films

Plasma Ru


Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Characteristic: Unknown
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

SiO2

Keywords

Nucleation

Notes

1005