The publication database currently has 1573 entries.
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196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
242 Film and Plasma Characteristics
84 Theses
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
Type:
Journal
Info:
Applied Physics Letters 89, 093115 (2006)
Date:
2006-07-03
Author Information
| Name | Institution |
|---|---|
| Sung-Soo Yim | Seoul National University |
| Moon-Sang Lee | Seoul National University |
| Ki-Su Kim | Seoul National University |
| Ki-Bum Kim | Seoul National University |
Films
Plasma Ru
Film/Plasma Properties
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Unknown
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| SiO2 |
Keywords
| Nucleation |
Notes
| 1005 |