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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
Type:
Journal
Info:
Applied Physics Letters 89, 093115 (2006)
Date:
2006-07-03
Author Information
| Name | Institution |
|---|---|
| Sung-Soo Yim | Seoul National University |
| Moon-Sang Lee | Seoul National University |
| Ki-Su Kim | Seoul National University |
| Ki-Bum Kim | Seoul National University |
Films
Plasma Ru
Film/Plasma Properties
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Unknown
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| SiO2 |
Keywords
| Nucleation |
Notes
| 1005 |