2021 Year in Review
The publication database currently has 1616 entries.
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202 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
250 Film and Plasma Characteristics
88 Theses
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
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Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
Type:
Journal
Info:
Applied Physics Letters 89, 093115 (2006)
Date:
2006-07-03
Author Information
| Name | Institution |
|---|---|
| Sung-Soo Yim | Seoul National University |
| Moon-Sang Lee | Seoul National University |
| Ki-Su Kim | Seoul National University |
| Ki-Bum Kim | Seoul National University |
Films
Plasma Ru
Film/Plasma Properties
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Unknown
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| SiO2 |
Keywords
| Nucleation |
Notes
| 1005 |