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ASM Genitech PEALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Genitech PEALD hardware returned 10 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
2Flexible Memristive Memory Array on Plastic Substrates
3Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
4Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
5Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
6Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
7Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
8Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
9Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
10The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films

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