ASM Genitech PEALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Genitech PEALD hardware returned 14 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
2	Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
3	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
4	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
5	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
6	Flexible Memristive Memory Array on Plastic Substrates
7	Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
8	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
9	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
10	Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
11	Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
12	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
13	Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
14	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films

Shortcuts

© 2014-2019 plasma-ald.com