ASM Genitech PEALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Genitech PEALD hardware returned 14 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
2Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
3Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
4Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
5Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
6Flexible Memristive Memory Array on Plastic Substrates
7Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
8Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
9Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
10Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
11Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
12Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
13Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
14The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films


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