Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices

Type:
Journal
Info:
Electrochemical and Solid-State Letters, 7 (9) H33-H35 (2004)
Date:
2004-01-02

Author Information

Name Institution
Jung Wook LimElectronics and Telecommunication Research Institute, (ETRI)
Sun Jin YunElectronics and Telecommunication Research Institute, (ETRI)

Films

Thermal TiO2


Plasma TiON


Plasma AlON


Film/Plasma Properties

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

ITO
ZnS:Mn

Notes

1166