Jung Wook Lim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jung Wook Lim returned 16 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
2Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
3Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
4Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
5Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
6Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
7Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
8Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
9Optical and Electrical Properties of TixSi1-xOy Films
10Optical and Electrical Properties of AlxTi1-xO Films
11Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
12PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
13Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
14Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
15Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
16Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition