Jung Wook Lim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jung Wook Lim returned 14 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
2Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
3Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
4Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
5Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
6Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
7Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
8Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
9Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
10Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
11Optical and Electrical Properties of AlxTi1-xO Films
12Optical and Electrical Properties of TixSi1-xOy Films
13PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
14Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment


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