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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 9(1) F8-F11 (2006)
Date:
2005-09-14
Author Information
| Name | Institution |
|---|---|
| Jung Wook Lim | Electronics and Telecommunication Research Institute, (ETRI) |
| Sun Jin Yun | Electronics and Telecommunication Research Institute, (ETRI) |
| Jin Ho Lee | Electronics and Telecommunication Research Institute, (ETRI) |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 194 |