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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
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Jin Ho Lee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jin Ho Lee returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
2Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
3Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
4Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
5PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
6Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
7Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
8Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils