Publication Information

Title: Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Electrochemical and Solid-State Letters, 8(9) F25-F28(2005)

Date: 2005-05-03

DOI: http://dx.doi.org/10.1149/1.1960041

Author Information

Name

Institution

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Films

Plasma AlSixOy using Custom

Deposition Temperature = 150C

75-24-1

78-10-4

7782-44-7

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

192



Shortcuts



© 2014-2018 plasma-ald.com