Publication Information

Title:
Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 8(9) F25-F28(2005)
Date:
2005-05-03

Author Information

Name Institution
Jung Wook LimElectronics and Telecommunication Research Institute, (ETRI)
Sun Jin YunElectronics and Telecommunication Research Institute, (ETRI)
Jin Ho LeeElectronics and Telecommunication Research Institute, (ETRI)

Films

Plasma AlSixOy


Film/Plasma Properties

Substrates

Keywords

Notes

192