Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Sun Jin Yun Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Sun Jin Yun returned 15 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
2Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
3Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
4Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
5PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
6Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
7Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
8Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
9Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
10Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
11Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
12Optical and Electrical Properties of TixSi1-xOy Films
13Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
14Optical and Electrical Properties of AlxTi1-xO Films
15Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition