Optical and Electrical Properties of AlxTi1-xO Films

Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 56, No. 1, January 2010, pp. 96-99
Date:
2009-10-12

Author Information

Name Institution
Jung Wook LimElectronics and Telecommunication Research Institute, (ETRI)
Sun Jin YunElectronics and Telecommunication Research Institute, (ETRI)
Seong Hyun LeeUniversity of Science and Technology

Films


Film/Plasma Properties

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Reflectivity
Analysis: -

Substrates

Si(100)
ITO

Keywords

AlTiO
Plasma-Enhanced Atomic Layer Deposition
Reflectance
Thin Film Solar Cell
AR, AntiReflective Coating

Notes

40