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Publication Information

Title: Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Journal of The Electrochemical Society, 154(11) G239-G243(2007)

Date: 2007-07-05

DOI: http://dx.doi.org/10.1149/1.2776162

Author Information

Name

Institution

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Films

Plasma Al2O3 using Custom

Deposition Temperature Range = 150-250C

75-24-1

7782-44-7

Plasma AlTixOy using Custom

Deposition Temperature Range = 150-250C

75-24-1

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

193



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