Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
Journal of The Electrochemical Society, 154(11) G239-G243(2007)
Date:
2007-07-05

Author Information

Name Institution
Jung Wook LimElectronics and Telecommunication Research Institute, (ETRI)
Sun Jin YunElectronics and Telecommunication Research Institute, (ETRI)
Hyun-Tak KimElectronics and Telecommunication Research Institute, (ETRI)

Films

Plasma Al2O3



Film/Plasma Properties

Substrates

Notes

193