Title: Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
Type: Journal
Info: Electrochemical and Solid-State Letters, 7 (11) F73-F76 (2004)
Date: 2004-04-22
DOI: http://dx.doi.org/10.1149/1.1805502
Name
Institution
Electronics and Telecommunication Research Institute, (ETRI)
Electronics and Telecommunication Research Institute, (ETRI)
Electronics and Telecommunication Research Institute, (ETRI)
Characteristic
Analysis
Diagnostic
Thickness
Unknown
Unknown
Uniformity
Unknown
Unknown
Microstructure
TEM, Transmission Electron Microscope
Unknown
Interfacial Layer
TEM, Transmission Electron Microscope
Unknown
Dielectric Constant, Permittivity
C-V, Capacitance-Voltage Measurements
Unknown
Leakage Current
I-V, Current-Voltage Measurements
Unknown
Breakdown Voltage
I-V, Current-Voltage Measurements
Unknown
Silicon
Plasma vs Thermal Comparison
1234
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