Title: Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
Type: Journal
Info: Electrochemical and Solid-State Letters, 7 (11) F73-F76 (2004)
Date: 2004-04-22
DOI: http://dx.doi.org/10.1149/1.1805502
Name
Institution
Electronics and Telecommunication Research Institute, (ETRI)
Electronics and Telecommunication Research Institute, (ETRI)
Electronics and Telecommunication Research Institute, (ETRI)
Characteristic
Analysis
Diagnostic
Thickness
Unknown
-
Uniformity
Unknown
-
Microstructure
TEM, Transmission Electron Microscope
-
Interfacial Layer
TEM, Transmission Electron Microscope
-
Dielectric Constant, Permittivity
C-V, Capacitance-Voltage Measurements
-
Leakage Current
I-V, Current-Voltage Measurements
-
Breakdown Voltage
I-V, Current-Voltage Measurements
-
Silicon
Plasma vs Thermal Comparison
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