Publication Information

Title: Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Electrochemical and Solid-State Letters, 8 (11) F47-F50 (2005)

Date: 2005-06-23

DOI: http://dx.doi.org/10.1149/1.2039952

Author Information

Name

Institution

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Electronics and Telecommunication Research Institute, (ETRI)

Films

Deposition Temperature Range = 100-250C

175923-04-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Substrates

Silicon

ITO

Keywords

Notes

1246



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