Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy TEMAZr, (EtMeN)4Zr, [(C2H5)(CH3)N]4Zr, Tetrakis(EthylMethylAmido) Zirconium, Zirconium Ethylmethylamide CAS# 175923-04-3

TEMAZr, (EtMeN)4Zr, [(C2H5)(CH3)N]4Zr, Tetrakis(EthylMethylAmido) Zirconium, Zirconium Ethylmethylamide CAS# 175923-04-3 is available from the following source(s):

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Tetrakis(ethylmethylamido)zirconium(IV)
2Strem Chemicals, Inc.🇺🇸Tetrakis(ethylmethylamino)zirconium(IV) 99% TEMAZ, contained in 50 ml cylinder for CVD/ALD
3Gelest🇺🇸Zirconium Tetrakis(Ethylmethylamide)
4Strem Chemicals, Inc.🇺🇸Tetrakis(ethylmethylamino)zirconium, 99% TEMAZ
5DOCK/CHEMICALS🇩🇪Tetrakis(ethylmethylamido)zirconium
6Ereztech🇺🇸Tetrakis(ethylmethylamino) zirconium

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