ZrO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing ZrO2 films returned 39 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
2Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
3Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
4Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
5Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
6Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
7Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
8Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
9Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
10Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
11High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
12High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
13Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
14Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
15Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
16Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
17In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
18Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
19Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
20Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
21Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
22PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
23PEALD ZrO2 Films Deposition on TiN and Si Substrates
24Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
25Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
26Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
27Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
28RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
29Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
30Single-Cell Photonic Nanocavity Probes
31Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
32Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
33Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
34Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
35The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
36Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
37Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
38ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
39ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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