Name

Institution

Gary Shambat

Stanford University

Sri-Rajasekhar Kothapalli

Stanford University

J Provine

Stanford University

Tomas Sarmiento

Stanford University

James Harris

Stanford University

Sanjiv Sam Gambhir

Stanford University

Jelena Vuckovic

Stanford University

Thermal ZrO₂ using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature = 200C

TDMAZ, Tetrakis[(DiMethyl)Amido] Zirconium, [Me₂N]₄Zr

19756-04-8

Where to buy precursor

Water, H₂O

7732-18-5

Thermal Al₂O₃ using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature = 200C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Water, H₂O

7732-18-5

Plasma SiO₂ using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature = 200C

3DMAS, Tris(DiMethylAmido)Silane

15112-89-7

Where to buy precursor

Oxygen, O₂

7782-44-7

Characteristic

Analysis

Diagnostic

GaAs

Nanocavity

Biological Cell

Sensors

Protein Detection

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