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265 Precursors and Plasma Gases
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Single-Cell Photonic Nanocavity Probes
Type:
Journal
Info:
Nano Lett, 2013, 13(11), pp 4999-5005
Date:
2013-02-06
Author Information
| Name | Institution |
|---|---|
| Gary Shambat | Stanford University |
| Sri-Rajasekhar Kothapalli | Stanford University |
| J Provine | Stanford University |
| Tomas Sarmiento | Stanford University |
| James Harris | Stanford University |
| Sanjiv Sam Gambhir | Stanford University |
| Jelena Vuckovic | Stanford University |
Films
Thermal ZrO2
Thermal Al2O3
Plasma SiO2
Film/Plasma Properties
Substrates
| GaAs |
Keywords
| Nanocavity |
| Biological Cell |
| Sensors |
| Protein Detection |
Notes
| 46 |