TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide, CAS# 19756-04-8

Where to buy

NumberVendorRegionLink
1Gelest🇺🇸Zirconium Tetrakis(Dimethylamide)
2Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% TDMAZ
3Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, contained in 50 ml cylinder for CVD/ALD
4DOCK/CHEMICALS🇩🇪Tetrakis(dimethylamido)zirconium
5Pegasus Chemicals🇬🇧Tetrakis(dimethylamido)zirconium(IV)
6Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% (99.99%-Zr) TDMAZ
7Ereztech🇺🇸Tetrakis(dimethylamino) zirconium
8Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% (99.99%-Zr) TDMAZ, 40-4115, contained in 50ml cylinder (96-1070) for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 39 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Single-Cell Photonic Nanocavity Probes
2Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
3The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
4Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
5Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
6Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
7Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
8Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
9Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
10Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
11Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
12Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
13Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
14Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
15Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
16Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
17Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
18AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
19In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
20Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
21Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
22Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
23Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
24Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
25Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
26Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
27Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
28Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
29Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
30Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
31Nonvolatile Capacitive Crossbar Array for In-Memory Computing
32Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
33Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
34Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
35In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
36ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
37Sub-7-nm textured ZrO2 with giant ferroelectricity
38Lithium-Iron (III) Fluoride Battery with Double Surface Protection
39Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors