Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide, CAS# 19756-04-8

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% (99.99%-Zr) TDMAZ
2Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% TDMAZ
3DOCK/CHEMICALS🇩🇪Tetrakis(dimethylamido)zirconium
4Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% (99.99%-Zr) TDMAZ, 40-4115, contained in 50ml cylinder (96-1070) for CVD/ALD
5Ereztech🇺🇸Tetrakis(dimethylamino) zirconium
6Gelest🇺🇸Zirconium Tetrakis(Dimethylamide)
7Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, contained in 50 ml cylinder for CVD/ALD
8Pegasus Chemicals🇬🇧Tetrakis(dimethylamido)zirconium(IV)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 39 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
2Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
3ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
4Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
5Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
6Nonvolatile Capacitive Crossbar Array for In-Memory Computing
7Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
8Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
9Lithium-Iron (III) Fluoride Battery with Double Surface Protection
10Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
11Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
12Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
13Sub-7-nm textured ZrO2 with giant ferroelectricity
14Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
15Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
16Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
17Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
18Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
19Single-Cell Photonic Nanocavity Probes
20Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
21In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
22Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
23Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
24Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
25Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
26Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
27Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
28In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
29Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
30Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
31Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
32Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
33Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
34The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
35Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
36Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
37Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
38AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
39Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices