TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide, CAS# 19756-04-8

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% (99.99%-Zr) TDMAZ
2DOCK/CHEMICALS🇩🇪Tetrakis(dimethylamido)zirconium
3Ereztech🇺🇸Tetrakis(dimethylamino) zirconium
4Pegasus Chemicals🇬🇧Tetrakis(dimethylamido)zirconium(IV)
5Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium, 99% TDMAZ
6Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% (99.99%-Zr) TDMAZ, 40-4115, contained in 50ml cylinder (96-1070) for CVD/ALD
7Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, contained in 50 ml cylinder for CVD/ALD
8Gelest🇺🇸Zirconium Tetrakis(Dimethylamide)

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 39 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
2Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
3In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
4Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
5Nonvolatile Capacitive Crossbar Array for In-Memory Computing
6Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
7Lithium-Iron (III) Fluoride Battery with Double Surface Protection
8Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
9The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
10Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
11Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
13In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
14AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
15Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
16Single-Cell Photonic Nanocavity Probes
17Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
18Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
19Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
20Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
21Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
22Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
23Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
24Sub-7-nm textured ZrO2 with giant ferroelectricity
25Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
26Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
27Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
28Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
29ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
30Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
31Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
32Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
33Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
34Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
35Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
36Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
37Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
38Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
39Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma