TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide, CAS# 19756-04-8

Where to buy

NumberVendorLink
1GelestZirconium Tetrakis(Dimethylamide)
2Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium, 99% (99.99%-Zr) TDMAZ
3Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium, 99% TDMAZ
4Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, contained in 50 ml cylinder for CVD/ALD
5EreztechTetrakis(dimethylamino) zirconium
6Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium(IV), 99% (99.99%-Zr) TDMAZ, 40-4115, contained in 50ml cylinder (96-1070) for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 36 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
2Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
3Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
4Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
5Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
6Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
7Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
8Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
9AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
10Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
11Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
12Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
13Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
14Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
15Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
16Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
17Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
18Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
19In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
20Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
21Lithium-Iron (III) Fluoride Battery with Double Surface Protection
22Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
23Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
24Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
25Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
26Single-Cell Photonic Nanocavity Probes
27Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
28Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
29Sub-7-nm textured ZrO2 with giant ferroelectricity
30Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
31Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
32The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
33Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
34ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
35Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
36In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics