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TDMAZ, Tetrakis[(DiMethyl)Amido] Zirconium, [Me2N]4Zr, CAS# 19756-04-8

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium, 99% TDMAZ
2Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.Tetrakis(dimethylamino)zirconium, 99% (99.99%-Zr) TDMAZ

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 24 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
2Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
3Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
4Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
5Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
6Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
7AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
8Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
9Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
10Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
11Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
13Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
14Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
15Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
16Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
17Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
18Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
19Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
20Single-Cell Photonic Nanocavity Probes
21Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
22Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
23Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
24ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition

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