Publication Information

Title:
Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
Type:
Journal
Info:
Applied Physics Letters 116, 032901 (2020)
Date:
2020-01-11

Author Information

Name Institution
Glen WaltersUniversity of Florida
Aniruddh ShekhawatUniversity of Florida
Saeed MoghaddamUniversity of Florida
Jacob L. JonesNorth Carolina State University
Toshikazu NishidaUniversity of Florida

Films




Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Ferroelectricity
Analysis: Custom

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Substrates

Silicon
TiN

Keywords

Plasma vs Thermal Comparison

Notes

1453