TDMAHf, tetrakis(dimethylamido)hafnium, hafnium dimethylamide, (Me2N)4Hf, also CAS# 19782-68-4, CAS# 19962-11-9

Informational Websites

NumberWebsite
1https://pubchem.ncbi.nlm.nih.gov/compound/140609#section=Top

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, contained in 50 ml cylinder with high temperature valve for CVD/ALD
2Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, contained in 50 ml cylinder for CVD/ALD
3Sigma-Aldrich, Co. LLC🇺🇸Tetrakis(dimethylamido)hafnium(IV) 99.99%
4American Elements🇺🇸Tetrakis(dimethylamido)hafnium(IV)
5Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH
6DOCK/CHEMICALS🇩🇪Tetrakis(dimethylamido)hafnium
7Apollo Scientific🇬🇧Tetrakis(dimethylamino)hafnium(IV) 99.999%
8Gelest🇺🇸Hafnium Dimethylamide
9Ereztech🇺🇸Tetrakis(dimethylamino) hafnium(IV)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 75 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
2Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
3Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
4HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
5Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
6On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
7The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
8Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
9Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
10Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
11Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
12Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
13Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
14Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
15Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
16Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
17Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
18Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
19Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
20HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
21TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
22Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
23Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
24Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
25Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
26High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
27Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
28The effects of layering in ferroelectric Si-doped HfO2 thin films
29The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
30Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
31Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
32Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
33Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
34HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
35Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
36ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
37Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
38Damage evaluation in graphene underlying atomic layer deposition dielectrics
39Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
40Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
41Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
42Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
43Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
44Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
45Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
46Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
47Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
48Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
49Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
50Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
51In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
52Nonvolatile Capacitive Crossbar Array for In-Memory Computing
53Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
54Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
55Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
56Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
57Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
58Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
59Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
60Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
61A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
62Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
63Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
64Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
65Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
66Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
67Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
68A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
69AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
70Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
71Annealing behavior of ferroelectric Si-doped HfO2 thin films
72Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
73Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
74Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
75Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time