Publication Information

Title:
Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 9 (8) C123-C125 (2006)
Date:
2006-03-28

Author Information

Name Institution
Eun-Jeong KimChonnam National University
Do-Heyoung KimChonnam National University

Films




Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Substrates

SiO2

Keywords

Notes

1309