Do-Heyoung Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Do-Heyoung Kim returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
2Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
3Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
4Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition