Publication Information

Title: Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma

Type: Journal

Info: Korean Journal of Chemical Engineering, December 2018, Volume 35, Issue 12, pp 2474–2479

Date: 2018-10-23

DOI: http://dx.doi.org/10.1007/s11814-018-0179-5

Author Information

Name

Institution

Chonnam National University

Chonnam National University

Chonnam National University

Chonnam National University

Films

Plasma NiOx using Custom

Deposition Temperature Range = 100-325C

31886-51-8

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Gaertner

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MPD X-ray Diffractometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific Multilab 2000

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Park Systems, XE-100

Substrates

Silicon

Keywords

Notes

1214



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