Publication Information

Title:
Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
Type:
Journal
Info:
Korean Journal of Chemical Engineering, December 2018, Volume 35, Issue 12, pp 2474-2479
Date:
2018-10-23

Author Information

Name Institution
Su-Hyeon JiChonnam National University
Woo-Sung JangChonnam National University
Jeong-Wook SonChonnam National University
Do-Heyoung KimChonnam National University

Films

Plasma NiOx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Silicon

Keywords

Notes

1214