Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Bis(ethylcyclopentadienyl)nickel, (EtCp)2Ni CAS# 31886-51-8

Bis(ethylcyclopentadienyl)nickel, (EtCp)2Ni CAS# 31886-51-8 is available from the following source(s):

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Bis(ethylcyclopentadienyl)nickel, min. 98%
2Pegasus Chemicals🇬🇧Bis(ethylcyclopentadienyl)nickel
3Ereztech🇺🇸Bis(ethylcyclopentadienyl) nickel

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