Publication Information

Title:
Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
Type:
Journal
Info:
Appl. Phys. Lett. 103, 263115 (2013)
Date:
2013-12-12

Author Information

Name Institution
Yoontae HwangUniversity of California - San Diego
Binh-Minh NguyenUniversity of California - San Diego
Shadi A. DayehUniversity of California - San Diego

Films

Plasma Pt




Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: TLM, Transmission Line Measurement

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope

Characteristic: Transistor Characteristics
Analysis: -

Substrates

SiO2
HfO2

Keywords

PEALD Film Development
Nanowire Transistors
Nucleation

Notes

Picosun SUNALE R-200 Pt with reduced nucleation delay through TMA prepulse optimization.
170