Publication Information

Title:
Damage evaluation in graphene underlying atomic layer deposition dielectrics
Type:
Journal
Info:
Scientific Reports 5, Article number: 13523 (2015)
Date:
2015-07-27

Author Information

Name Institution
Xiaohui TangUniversite catholique de Louvain (UCL)
Nicolas ReckingerUniversity of Namur
Olivier PonceletUniversite catholique de Louvain (UCL)
Pierre LouetteUniversity of Namur
Ferran UreñaUniversite catholique de Louvain (UCL)
Hosni IdrissiUniversity of Antwerp
Stuart TurnerUniversity of Antwerp
Damien CabosartUniversite catholique de Louvain (UCL)
Jean-François ColomerUniversity of Namur
Jean-Pierre RaskinUniversite catholique de Louvain (UCL)
Benoit HackensUniversite catholique de Louvain (UCL)
Laurent A. FrancisUniversite catholique de Louvain (UCL)

Films


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Substrates

Graphene

Keywords

Notes

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