Damage evaluation in graphene underlying atomic layer deposition dielectrics
Type:
Journal
Info:
Scientific Reports 5, Article number: 13523 (2015)
Date:
2015-07-27
Author Information
| Name | Institution |
|---|---|
| Xiaohui Tang | Universite catholique de Louvain (UCL) |
| Nicolas Reckinger | University of Namur |
| Olivier Poncelet | Universite catholique de Louvain (UCL) |
| Pierre Louette | University of Namur |
| Ferran Ureña | Universite catholique de Louvain (UCL) |
| Hosni Idrissi | University of Antwerp |
| Stuart Turner | University of Antwerp |
| Damien Cabosart | Universite catholique de Louvain (UCL) |
| Jean-François Colomer | University of Namur |
| Jean-Pierre Raskin | Universite catholique de Louvain (UCL) |
| Benoit Hackens | Universite catholique de Louvain (UCL) |
| Laurent A. Francis | Universite catholique de Louvain (UCL) |
Films
Plasma HfO2
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Substrates
| Graphene |
Notes
| 381 |