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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Jean-Pierre Raskin Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jean-Pierre Raskin returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
2Damage evaluation in graphene underlying atomic layer deposition dielectrics
3Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
4Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
5Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
6Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application