Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
Type:
Journal
Info:
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 21, NO.6, 2012
Date:
2012-07-17
Author Information
| Name | Institution |
|---|---|
| P. Gkotsis | Universite catholique de Louvain (UCL) |
| Valeriya Kilchytska | Universite catholique de Louvain (UCL) |
| C. Fragkiadakis | Cranfield University |
| P. B. Kirby | Cranfield University |
| Jean-Pierre Raskin | Universite catholique de Louvain (UCL) |
| Laurent A. Francis | Universite catholique de Louvain (UCL) |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: -
Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Interface State Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Substrate Impurity Concentration
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Midgap Voltage
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Si(100) |
Notes
| 643 |