Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


C. Fragkiadakis Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by C. Fragkiadakis returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
2Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems