Publication Information

Title:
Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
Type:
Conference Proceedings
Info:
12th International Symposium on Materials in the Space Environment (ISME'12)
Date:
2012-09-24

Author Information

Name Institution
P. GkotsisUniversite catholique de Louvain (UCL)
V. KilchytskaUniversite catholique de Louvain (UCL)
Otilia MilitaruUniversite catholique de Louvain (UCL)
Guy BergerUniversite catholique de Louvain (UCL)
C. FragkiadakisHewlett-Packard
P. B. KirbyCranfield University
Jean-Pierre RaskinUniversite catholique de Louvain (UCL)
Denis FlandreUniversite catholique de Louvain (UCL)
Laurent A. FrancisUniversite catholique de Louvain (UCL)

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Interface State Density
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Midgap Voltage
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Si(100)

Keywords

Radiation Hardness

Notes

644