2021 Year in Review
The publication database currently has 1616 entries.
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202 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
250 Film and Plasma Characteristics
88 Theses
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
Search 1616 plasma ALD publications by:
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Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
Type:
Conference Proceedings
Info:
12th International Symposium on Materials in the Space Environment (ISME'12)
Date:
2012-09-24
Author Information
| Name | Institution |
|---|---|
| P. Gkotsis | Universite catholique de Louvain (UCL) |
| V. Kilchytska | Universite catholique de Louvain (UCL) |
| Otilia Militaru | Universite catholique de Louvain (UCL) |
| Guy Berger | Universite catholique de Louvain (UCL) |
| C. Fragkiadakis | Hewlett-Packard |
| P. B. Kirby | Cranfield University |
| Jean-Pierre Raskin | Universite catholique de Louvain (UCL) |
| Denis Flandre | Universite catholique de Louvain (UCL) |
| Laurent A. Francis | Universite catholique de Louvain (UCL) |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Interface State Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Midgap Voltage
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Si(100) |
Keywords
| Radiation Hardness |
Notes
| 644 |