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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Denis Flandre Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Denis Flandre returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
2Passivation effects of atomic-layer-deposited aluminum oxide
3Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
4Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
5A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
6Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application