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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
Type:
Journal
Info:
Biosensors and Bioelectronics Available online 7 August 2014
Date:
2014-07-31
Author Information
| Name | Institution |
|---|---|
| Numa Couniot | Universite catholique de Louvain (UCL) |
| T. Vanzieleghem | Universite catholique de Louvain (UCL) |
| J. Rasson | Universite catholique de Louvain (UCL) |
| N. Van Overstraeten-Schlögel | Universite catholique de Louvain (UCL) |
| Olivier Poncelet | Universite catholique de Louvain (UCL) |
| J. Mahillon | Universite catholique de Louvain (UCL) |
| Laurent A. Francis | Universite catholique de Louvain (UCL) |
| Denis Flandre | Universite catholique de Louvain (UCL) |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
| Al |
| Pyrex |
Keywords
| Medical |
| Corrosion |
| Bacteria Detection |
| LoC (Lab on Chip) |
| PoC (Point of Care) |
Notes
| Ultratech Fiji room temperature PEALD Al2O3 for point of care bacteria detection diagnostic microelectrode passivation. |
| 161 |