Publication Information

Title:
Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
Type:
Journal
Info:
J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012
Date:
2011-10-17

Author Information

Name Institution
Xiaohui TangUniversite catholique de Louvain (UCL)
Laurent A. FrancisUniversite catholique de Louvain (UCL)
P. SimonisFacult├ęs Universitaires Notre-Dame de la Paix
M. HaslingerUniversite catholique de Louvain (UCL)
R. DelamareUniversite catholique de Louvain (UCL)
O. DeschaumeUniversite catholique de Louvain (UCL)
Denis FlandreUniversite catholique de Louvain (UCL)
P. DefranceUniversite catholique de Louvain (UCL)
A. M. JonasUniversite catholique de Louvain (UCL)
J. P. VigneronFacult├ęs Universitaires Notre-Dame de la Paix
Jean-Pierre RaskinUniversite catholique de Louvain (UCL)

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Minority Carrier Lifetime
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Silicon
Butterfly Wing

Keywords

Passivation
Thin Film Solar Cell

Notes

Ultratech Fiji PEALD Al2O3 for silicon solar cell passivation layer and butterfly wing-like anti-reflection structure.
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