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Publication Information

Title: Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application

Type: Journal

Info: J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012

Date: 2011-10-17

DOI: http://dx.doi.org/10.1116/1.3669521

Author Information

Name

Institution

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Facultés Universitaires Notre-Dame de la Paix

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Universite catholique de Louvain (UCL)

Facultés Universitaires Notre-Dame de la Paix

Universite catholique de Louvain (UCL)

Films

Deposition Temperature Range = 25-250C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Fixed Charge

C-V, Capacitance-Voltage Measurements

Unknown

Minority Carrier Lifetime

QSSPC, Quasi-Steady-State PhotoConductance Decay

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Substrates

Silicon

Butterfly Wing

Keywords

Passivation

Thin Film Solar Cell

Notes

Ultratech Fiji PEALD Al2O3 for silicon solar cell passivation layer and butterfly wing-like anti-reflection structure.

153

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