Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Single-Cell Photonic Nanocavity Probes
2On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
3Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
4Self-Limiting Growth of GaN at Low Temperatures
5Atomic layer epitaxy for quantum well nitride-based devices
6A high-density carbon fiber neural recording array technology
7Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
8Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
9Programmable on-chip DNA compartments as artificial cells
10Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
11Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
12Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
13Fully CMOS-compatible titanium nitride nanoantennas
14Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
15Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
16Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
17Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
18Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
19Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
20Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
21New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
22Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
23Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
24Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
25Biofilm prevention on cochlear implants
26Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
27Plasma-enhanced atomic layer deposition of tungsten nitride
28Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
29Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
30Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
31The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
32Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
33Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
34The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
35Damage evaluation in graphene underlying atomic layer deposition dielectrics
36Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
37Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
38Atomic layer deposition of titanium nitride for quantum circuits
39Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
40Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
41Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
42Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
43Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
44Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
45AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
46Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
47Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
48Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
49Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
50Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
51Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
52Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
53Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
54AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
55Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
56Plasma-enhanced atomic layer deposition of titanium vanadium nitride
57Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
58Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
59Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
60Design and development of nanoimprint-enabled structures for molecular motor devices
61Atomic Layer Deposition of the Solid Electrolyte LiPON
62Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
63Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
64A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
65Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
66Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
67Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
68Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
69Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
70Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
71Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
72Mechanical properties of thin-film Parylene-metal-Parylene devices
73AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
74Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
75Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
76In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
77Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
78High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
79Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
80Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
81A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
82Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
83Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
84P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
85Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
86Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
87Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
88Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
89Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
90Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
91Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
92Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
93Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
94Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
95Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
96Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
97Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
98Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
99Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
100Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
101Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
102The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
103Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
104Impact of interface materials on side permeation in indirect encapsulation of organic electronics
105Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
106Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
107Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
108Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
109The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
110Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
111Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
112Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
113Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
114Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
115Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
116Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
117The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
118In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
119Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
120Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
121Sub-7-nm textured ZrO2 with giant ferroelectricity
122Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
123Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
124Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
125The effects of layering in ferroelectric Si-doped HfO2 thin films
126The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
127Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
128Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
129Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
130Fiber-matrix interface reinforcement using Atomic Layer Deposition
131Plasma-enhanced atomic layer deposition of superconducting niobium nitride
132Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
133ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
134Lithium-Iron (III) Fluoride Battery with Double Surface Protection
135Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
136Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
137Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
138Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
139Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
140Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
141Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
142Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
143Annealing behavior of ferroelectric Si-doped HfO2 thin films
144Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
145The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
146Band alignment of Al2O3 with (-201) β-Ga2O3
147Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
148Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
149Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
150Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
151Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
152Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
153Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
154ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
155Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
156Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
157Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
158DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
159ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
160Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
161RF Characterization of Novel Superconducting Materials and Multilayers
162Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
163Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
164Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
165Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
166ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
167Atomic layer deposition of metal-oxide thin films on cellulose fibers
168Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
169Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
170Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
171Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
172Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
173In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
174Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
175Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
176Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
177Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
178Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
179Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
180Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
181Sub-nanometer heating depth of atomic layer annealing
182Atomic layer deposition of GaN at low temperatures
183Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
184Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
185AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
186Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
187Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
188Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
189Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
190Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
191Nonvolatile Capacitive Crossbar Array for In-Memory Computing
192Plasma-enhanced atomic layer deposition of vanadium nitride
193Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
194Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
195Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
196Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
197Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
198Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
199Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
200TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
201Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
202Perspectives on future directions in III-N semiconductor research
203Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
204An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
205Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
206Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
207Passivation effects of atomic-layer-deposited aluminum oxide
208Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
209Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
210Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
211Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
212Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
213Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
214Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
215Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
216Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
217Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
218Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
219Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
220GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
221Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
222Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
223Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
224Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
225Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
226Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
227Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
228Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
229ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
230Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
231Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
232Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
233Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
234High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
235Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
236Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
237Impact of degradable nanowires on long-term brain tissue responses
238Performance of Samples with Novel SRF Materials and Growth Techniques
239A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
240Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
241Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
242Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
243Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
244Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
245Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
246Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions