Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
2A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
3A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
4A high-density carbon fiber neural recording array technology
5Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
6Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
7ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
8ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
9ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
10ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
11ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
12AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
13AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
14AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
15AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
16Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
17Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
18An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
19Annealing behavior of ferroelectric Si-doped HfO2 thin films
20Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
21Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
22Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
23Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
24Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
25Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
26Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
27Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
28Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
29Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
30Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
31Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
32Atomic layer deposition of GaN at low temperatures
33Atomic layer deposition of metal-oxide thin films on cellulose fibers
34Atomic Layer Deposition of the Solid Electrolyte LiPON
35Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
36Atomic layer deposition of titanium nitride for quantum circuits
37Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
38Atomic layer epitaxy for quantum well nitride-based devices
39Band alignment of Al2O3 with (-201) β-Ga2O3
40Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
41Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
42Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
43Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
44Biofilm prevention on cochlear implants
45Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
46Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
47Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
48Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
49Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
50Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
51Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
52Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
53Damage evaluation in graphene underlying atomic layer deposition dielectrics
54Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
55DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
56Design and development of nanoimprint-enabled structures for molecular motor devices
57Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
58Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
59Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
60Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
61Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
62Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
63Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
64Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
65Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
66Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
67Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
68Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
69Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
70Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
71Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
72Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
73Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
74Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
75Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
76Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
77Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
78Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
79Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
80Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
81Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
82Fiber-matrix interface reinforcement using Atomic Layer Deposition
83Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
84Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
85Fully CMOS-compatible titanium nitride nanoantennas
86GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
87Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
88Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
89Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
90Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
91High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
92High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
93Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
94Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
95Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
96Impact of degradable nanowires on long-term brain tissue responses
97Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
98Impact of interface materials on side permeation in indirect encapsulation of organic electronics
99Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
100Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
101Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
102Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
103Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
104Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
105Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
106In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
107In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
108Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
109Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
110Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
111Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
112Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
113Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
114Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
115Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
116Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
117Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
118Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
119Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
120Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
121Lithium-Iron (III) Fluoride Battery with Double Surface Protection
122Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
123Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
124Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
125Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
126Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
127Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
128Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
129Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
130Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
131Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
132Mechanical properties of thin-film Parylene-metal-Parylene devices
133Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
134Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
135Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
136Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
137Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
138Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
139New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
140Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
141Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
142On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
143Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
144Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
145P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
146Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
147Passivation effects of atomic-layer-deposited aluminum oxide
148Perspectives on future directions in III-N semiconductor research
149Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
150Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
151Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
152Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
153Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
154Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
155Plasma-enhanced atomic layer deposition of superconducting niobium nitride
156Plasma-enhanced atomic layer deposition of titanium vanadium nitride
157Plasma-enhanced atomic layer deposition of tungsten nitride
158Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
159Plasma-enhanced atomic layer deposition of vanadium nitride
160Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
161Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
162Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
163Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
164Programmable on-chip DNA compartments as artificial cells
165Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
166Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
167Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
168Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
169Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
170Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
171Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
172Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
173Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
174Self-Limiting Growth of GaN at Low Temperatures
175Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
176Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
177Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
178Single-Cell Photonic Nanocavity Probes
179Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
180Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
181Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
182Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
183Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
184Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
185Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
186Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
187Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
188Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
189Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
190Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
191Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
192Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
193Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
194TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
195Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
196The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
197The effects of layering in ferroelectric Si-doped HfO2 thin films
198The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
199The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
200The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
201The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
202The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
203The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
204Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
205Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
206Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
207Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
208Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
209Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
210Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
211Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
212Using top graphene layer as sacrificial protection during dielectric atomic layer deposition