Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
2Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
3Fully CMOS-compatible titanium nitride nanoantennas
4Performance of Samples with Novel SRF Materials and Growth Techniques
5GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
6Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
7Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
8The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
9Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
10Plasma-enhanced atomic layer deposition of tungsten nitride
11High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
12Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
13Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
14Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
15Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
16Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
17Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
18Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
19ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
20Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
21A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
22Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
23Plasma-enhanced atomic layer deposition of superconducting niobium nitride
24Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
25The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
26Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
27Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
28Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
29Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
30Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
31Sub-nanometer heating depth of atomic layer annealing
32Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
33Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
34Plasma-enhanced atomic layer deposition of vanadium nitride
35Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
36Damage evaluation in graphene underlying atomic layer deposition dielectrics
37Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
38Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
39Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
40Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
41The effects of layering in ferroelectric Si-doped HfO2 thin films
42Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
43Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
44Atomic layer deposition of metal-oxide thin films on cellulose fibers
45High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
46Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
47Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
48Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
49Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
50Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
51Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
52Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
53In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
54Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
55AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
56DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
57Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
58Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
59Atomic layer epitaxy for quantum well nitride-based devices
60Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
61Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
62The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
63Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
64Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
65Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
66AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
67Atomic layer deposition of titanium nitride for quantum circuits
68AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
69Lithium-Iron (III) Fluoride Battery with Double Surface Protection
70Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
71Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
72A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
73Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
74Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
75Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
76Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
77Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
78Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
79Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
80Impact of degradable nanowires on long-term brain tissue responses
81Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
82Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
83The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
84ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
85ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
86New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
87Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
88Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
89Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
90Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
91Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
92ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
93Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
94Single-Cell Photonic Nanocavity Probes
95Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
96Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
97Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
98Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
99Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
100Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
101The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
102Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
103Perspectives on future directions in III-N semiconductor research
104Self-Limiting Growth of GaN at Low Temperatures
105Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
106Annealing behavior of ferroelectric Si-doped HfO2 thin films
107Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
108Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
109Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
110In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
111Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
112Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
113Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
114Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
115Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
116Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
117Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
118Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
119Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
120The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
121Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
122Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
123Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
124Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
125Mechanical properties of thin-film Parylene-metal-Parylene devices
126Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
127Passivation effects of atomic-layer-deposited aluminum oxide
128Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
129Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
130Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
131Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
132Sub-7-nm textured ZrO2 with giant ferroelectricity
133Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
134Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
135Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
136Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
137Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
138Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
139P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
140Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
141Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
142Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
143Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
144Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
145Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
146Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
147Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
148Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
149An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
150Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
151Atomic Layer Deposition of the Solid Electrolyte LiPON
152Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
153Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
154Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
155Biofilm prevention on cochlear implants
156Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
157ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
158Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
159Nonvolatile Capacitive Crossbar Array for In-Memory Computing
160Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
161Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
162Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
163Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
164Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
165Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
166Impact of interface materials on side permeation in indirect encapsulation of organic electronics
167Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
168TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
169Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
170Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
171Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
172Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
173A high-density carbon fiber neural recording array technology
174Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
175Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
176Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
177Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
178Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
179Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
180Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
181Programmable on-chip DNA compartments as artificial cells
182Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
183Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
184Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
185Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
186On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
187Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
188Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
189Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
190Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
191Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
192Plasma-enhanced atomic layer deposition of titanium vanadium nitride
193Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
194Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
195Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
196The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
197Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
198Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
199Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
200Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
201Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
202Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
203Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
204Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
205Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
206Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
207Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
208Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
209Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
210Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
211Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
212Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
213Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
214Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
215Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
216Fiber-matrix interface reinforcement using Atomic Layer Deposition
217Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
218Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
219Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
220In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
221Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
222Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
223Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
224Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
225Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
226Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
227AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
228Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
229Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
230Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
231Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
232RF Characterization of Novel Superconducting Materials and Multilayers
233Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
234A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
235Design and development of nanoimprint-enabled structures for molecular motor devices
236Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
237Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
238Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
239Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
240Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
241Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
242Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
243Atomic layer deposition of GaN at low temperatures
244Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
245Band alignment of Al2O3 with (-201) β-Ga2O3
246Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors