Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
2A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
3A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
4A high-density carbon fiber neural recording array technology
5Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
6Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
7ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
8ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
9ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
10ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
11ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
12AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
13AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
14AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
15AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
16Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
17Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
18An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
19Annealing behavior of ferroelectric Si-doped HfO2 thin films
20Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
21Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
22Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
23Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
24Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
25Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
26Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
27Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
28Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
29Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
30Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
31Atomic layer deposition of GaN at low temperatures
32Atomic layer deposition of metal-oxide thin films on cellulose fibers
33Atomic Layer Deposition of the Solid Electrolyte LiPON
34Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
35Atomic layer deposition of titanium nitride for quantum circuits
36Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
37Atomic layer epitaxy for quantum well nitride-based devices
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
40Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
41Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
42Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
43Biofilm prevention on cochlear implants
44Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
45Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
46Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
47Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
48Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
49Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
50Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
51Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
52Damage evaluation in graphene underlying atomic layer deposition dielectrics
53Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
54DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
55Design and development of nanoimprint-enabled structures for molecular motor devices
56Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
57Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
58Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
59Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
60Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
61Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
62Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
63Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
64Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
65Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
66Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
67Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
68Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
69Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
70Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
71Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
72Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
73Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
74Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
75Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
76Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
77Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
78Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
79Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
80Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
81Fiber-matrix interface reinforcement using Atomic Layer Deposition
82Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
83Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
84Fully CMOS-compatible titanium nitride nanoantennas
85GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
86Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
87Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
88Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
89Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
90High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
91High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
92Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
93Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
94Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
95Impact of degradable nanowires on long-term brain tissue responses
96Impact of interface materials on side permeation in indirect encapsulation of organic electronics
97Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
98Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
99Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
100Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
101Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
102Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
103Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
104In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
105In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
106Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
107Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
108Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
109Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
110Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
111Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
112Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
113Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
114Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
115Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
116Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
117Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
118Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
119Lithium-Iron (III) Fluoride Battery with Double Surface Protection
120Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
121Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
122Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
123Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
124Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
125Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
126Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
127Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
128Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
129Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
130Mechanical properties of thin-film Parylene-metal-Parylene devices
131Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
132Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
133Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
134Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
135Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
136Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
137New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
138Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
139Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
140On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
141Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
142Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
143P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
144Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
145Passivation effects of atomic-layer-deposited aluminum oxide
146Perspectives on future directions in III-N semiconductor research
147Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
148Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
149Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
150Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
151Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
152Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
153Plasma-enhanced atomic layer deposition of superconducting niobium nitride
154Plasma-enhanced atomic layer deposition of titanium vanadium nitride
155Plasma-enhanced atomic layer deposition of tungsten nitride
156Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
157Plasma-enhanced atomic layer deposition of vanadium nitride
158Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
159Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
160Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
161Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
162Programmable on-chip DNA compartments as artificial cells
163Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
164Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
165Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
166Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
167Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
168Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
169Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
170Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
171Self-Limiting Growth of GaN at Low Temperatures
172Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
173Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
174Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
175Single-Cell Photonic Nanocavity Probes
176Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
177Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
178Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
179Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
180Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
181Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
182Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
183Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
184Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
185Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
186Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
187Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
188TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
189Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
190The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
191The effects of layering in ferroelectric Si-doped HfO2 thin films
192The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
193The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
194The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
195The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
196The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
197The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
198Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
199Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
200Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
201Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
202Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
203Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
204Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
205Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
206Using top graphene layer as sacrificial protection during dielectric atomic layer deposition