Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
2Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
3Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
4Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
5Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
6Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
7Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
8Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
9Plasma-enhanced atomic layer deposition of tungsten nitride
10Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
11Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
12Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
13Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
14In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
15Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
16Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
17AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
18A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
19Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
20Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
21Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
22Design and development of nanoimprint-enabled structures for molecular motor devices
23Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
24Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
25Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
26Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
27Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
28Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
29Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
30Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
31Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
32Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
33The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
34Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
35Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
36Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
37Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
38Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
39Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
40Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
41Plasma-enhanced atomic layer deposition of vanadium nitride
42Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
43Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
44Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
45Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
46Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
47Lithium-Iron (III) Fluoride Battery with Double Surface Protection
48Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
49Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
50Perspectives on future directions in III-N semiconductor research
51Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
52Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
53Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
54Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
55Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
56Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
57Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
58Biofilm prevention on cochlear implants
59Atomic layer deposition of GaN at low temperatures
60Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
61Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
62Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
63Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
64Sub-7-nm textured ZrO2 with giant ferroelectricity
65Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
66Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
67The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
68Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
69Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
70Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
71Plasma-enhanced atomic layer deposition of titanium vanadium nitride
72Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
73Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
74Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
75Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
76Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
77ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
78P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
79The effects of layering in ferroelectric Si-doped HfO2 thin films
80Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
81Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
82Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
83Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
84Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
85Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
86Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
87ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
88Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
89Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
90Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
91In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
92Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
93Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
94Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
95Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
96Single-Cell Photonic Nanocavity Probes
97Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
98Impact of degradable nanowires on long-term brain tissue responses
99Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
100Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
101ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
102ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
103Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
104Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
105New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
106Self-Limiting Growth of GaN at Low Temperatures
107Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
108Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
109Atomic layer deposition of titanium nitride for quantum circuits
110Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
111Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
112Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
113Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
114Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
115Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
116Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
117Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
118Plasma-enhanced atomic layer deposition of superconducting niobium nitride
119Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
120Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
121Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
122Fiber-matrix interface reinforcement using Atomic Layer Deposition
123Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
124GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
125The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
126Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
127Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
128Impact of interface materials on side permeation in indirect encapsulation of organic electronics
129Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
130Damage evaluation in graphene underlying atomic layer deposition dielectrics
131Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
132Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
133Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
134Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
135Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
136Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
137DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
138Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
139Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
140Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
141Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
142Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
143Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
144Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
145Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
146Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
147A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
148Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
149Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
150Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
151Passivation effects of atomic-layer-deposited aluminum oxide
152Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
153Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
154Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
155Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
156Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
157Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
158Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
159Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
160AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
161High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
162Atomic layer deposition of metal-oxide thin films on cellulose fibers
163Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
164Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
165Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
166Fully CMOS-compatible titanium nitride nanoantennas
167Programmable on-chip DNA compartments as artificial cells
168Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
169Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
170Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
171The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
172Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
173Band alignment of Al2O3 with (-201) β-Ga2O3
174Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
175Atomic layer epitaxy for quantum well nitride-based devices
176Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
177AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
178Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
179Performance of Samples with Novel SRF Materials and Growth Techniques
180Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
181Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
182Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
183Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
184A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
185On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
186Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
187Annealing behavior of ferroelectric Si-doped HfO2 thin films
188Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
189In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
190Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
191Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
192Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
193Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
194Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
195The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
196The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
197Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
198Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
199Atomic Layer Deposition of the Solid Electrolyte LiPON
200Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
201Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
202Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
203Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
204Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
205AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
206Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
207TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
208Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
209Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
210Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
211The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
212Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
213Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
214Sub-nanometer heating depth of atomic layer annealing
215Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
216Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
217Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
218Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
219Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
220Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
221Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
222Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
223Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
224Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
225Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
226Mechanical properties of thin-film Parylene-metal-Parylene devices
227Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
228Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
229A high-density carbon fiber neural recording array technology
230Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
231Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
232Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
233ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
234Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
235Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
236Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
237High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition