Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
2Plasma-enhanced atomic layer deposition of superconducting niobium nitride
3AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
4Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
5Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
6Atomic layer deposition of metal-oxide thin films on cellulose fibers
7Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
8The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
9Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
10A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
11Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
12New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
13Plasma-enhanced atomic layer deposition of titanium vanadium nitride
14Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
15Biofilm prevention on cochlear implants
16Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
17Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
18TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
19Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
20Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
21Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
22Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
23Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
24Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
25Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
26Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
27Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
28Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
29Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
30Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
31Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
32Atomic layer deposition of GaN at low temperatures
33A high-density carbon fiber neural recording array technology
34Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
35Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
36Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
37Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
38Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
39Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
40Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
41Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
42Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
43Annealing behavior of ferroelectric Si-doped HfO2 thin films
44Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
45Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
46Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
47GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
48Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
49The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
50Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
51The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
52Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
53A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
54Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
55Mechanical properties of thin-film Parylene-metal-Parylene devices
56Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
57Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
58Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
59Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
60Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
61ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
62Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
63AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
64Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
65Plasma-enhanced atomic layer deposition of vanadium nitride
66Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
67Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
68Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
69Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
70Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
71Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
72Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
73Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
74An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
75Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
76Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
77Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
78Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
79Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
80Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
81Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
82The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
83Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
84Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
85Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
86Design and development of nanoimprint-enabled structures for molecular motor devices
87Atomic layer deposition of titanium nitride for quantum circuits
88In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
89Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
90The effects of layering in ferroelectric Si-doped HfO2 thin films
91Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
92Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
93Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
94Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
95Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
96Single-Cell Photonic Nanocavity Probes
97Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
98Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
99Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
100Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
101Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
102Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
103Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
104Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
105Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
106AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
107Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
108Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
109Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
110Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
111Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
112A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
113Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
114Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
115Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
116Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
117Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
118Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
119Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
120Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
121Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
122Self-Limiting Growth of GaN at Low Temperatures
123Band alignment of Al2O3 with (-201) β-Ga2O3
124Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
125Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
126Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
127DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
128Performance of Samples with Novel SRF Materials and Growth Techniques
129Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
130Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
131Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
132On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
133Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
134Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
135Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
136Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
137Fully CMOS-compatible titanium nitride nanoantennas
138Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
139Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
140Damage evaluation in graphene underlying atomic layer deposition dielectrics
141Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
142Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
143Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
144Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
145Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
146Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
147Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
148Perspectives on future directions in III-N semiconductor research
149Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
150Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
151Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
152Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
153ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
154Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
155Sub-7-nm textured ZrO2 with giant ferroelectricity
156Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
157Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
158Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
159Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
160Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
161Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
162Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
163Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
164Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
165Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
166Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
167Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
168Fiber-matrix interface reinforcement using Atomic Layer Deposition
169Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
170Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
171Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
172Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
173Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
174In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
175Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
176Atomic layer epitaxy for quantum well nitride-based devices
177Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
178Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
179Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
180Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
181Impact of interface materials on side permeation in indirect encapsulation of organic electronics
182Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
183Impact of degradable nanowires on long-term brain tissue responses
184Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
185Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
186Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
187Passivation effects of atomic-layer-deposited aluminum oxide
188Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
189ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
190AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
191Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
192Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
193Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
194In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
195Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
196ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
197Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
198Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
199The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
200The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
201Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
202Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
203Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
204Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
205P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
206Programmable on-chip DNA compartments as artificial cells
207Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
208The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
209Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
210Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
211Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
212Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
213Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
214Lithium-Iron (III) Fluoride Battery with Double Surface Protection
215Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
216ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
217Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
218Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
219Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
220Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
221Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
222Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
223Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
224Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
225Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
226Plasma-enhanced atomic layer deposition of tungsten nitride
227Atomic Layer Deposition of the Solid Electrolyte LiPON
228Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
229Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
230Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
231Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
232Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
233High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
234Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
235Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
236Sub-nanometer heating depth of atomic layer annealing
237High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition