Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
2Biofilm prevention on cochlear implants
3A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
4The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
5Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
6AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
7Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
8The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
9In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
10Mechanical properties of thin-film Parylene-metal-Parylene devices
11ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
12Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
13Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
14Impact of interface materials on side permeation in indirect encapsulation of organic electronics
15Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
16Fiber-matrix interface reinforcement using Atomic Layer Deposition
17TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
18Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
19Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
20Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
21Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
22Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
23Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
24Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
25Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
26Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
27P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
28Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
29Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
30AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
31High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
32Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
33Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
34Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
35Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
36Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
37Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
38Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
39Single-Cell Photonic Nanocavity Probes
40Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
41Impact of degradable nanowires on long-term brain tissue responses
42Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
43Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
44Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
45Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
46Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
47Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
48Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
49Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
50Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
51Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
52Plasma-enhanced atomic layer deposition of vanadium nitride
53Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
54Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
55Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
56Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
57Fully CMOS-compatible titanium nitride nanoantennas
58Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
59Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
60Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
61The effects of layering in ferroelectric Si-doped HfO2 thin films
62Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
63Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
64Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
65Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
66Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
67Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
68Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
69Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
70The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
71Lithium-Iron (III) Fluoride Battery with Double Surface Protection
72Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
73Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
74Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
75Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
76Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
77Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
78Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
79Self-Limiting Growth of GaN at Low Temperatures
80Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
81Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
82Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
83Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
84Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
85DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
86Annealing behavior of ferroelectric Si-doped HfO2 thin films
87Atomic layer epitaxy for quantum well nitride-based devices
88Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
89Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
90Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
91Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
92Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
93A high-density carbon fiber neural recording array technology
94Performance of Samples with Novel SRF Materials and Growth Techniques
95Plasma-enhanced atomic layer deposition of superconducting niobium nitride
96Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
97Atomic Layer Deposition of the Solid Electrolyte LiPON
98Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
99Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
100Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
101Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
102Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
103Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
104On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
105ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
106Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
107Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
108Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
109Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
110Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
111Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
112Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
113Atomic layer deposition of metal-oxide thin films on cellulose fibers
114Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
115Nonvolatile Capacitive Crossbar Array for In-Memory Computing
116Passivation effects of atomic-layer-deposited aluminum oxide
117Atomic layer deposition of titanium nitride for quantum circuits
118Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
119Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
120Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
121Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
122ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
123Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
124Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
125Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
126Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
127Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
128Atomic layer deposition of GaN at low temperatures
129Sub-nanometer heating depth of atomic layer annealing
130Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
131Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
132Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
133Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
134Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
135The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
136Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
137Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
138Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
139Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
140Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
141Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
142Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
143Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
144An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
145Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
146Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
147Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
148A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
149Programmable on-chip DNA compartments as artificial cells
150Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
151RF Characterization of Novel Superconducting Materials and Multilayers
152Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
153The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
154Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
155Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
156Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
157Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
158New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
159Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
160Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
161The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
162Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
163Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
164Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
165Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
166Damage evaluation in graphene underlying atomic layer deposition dielectrics
167Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
168Plasma-enhanced atomic layer deposition of titanium vanadium nitride
169The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
170Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
171Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
172ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
173Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
174Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
175Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
176ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
177In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
178Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
179Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
180Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
181Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
182Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
183Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
184Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
185Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
186In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
187Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
188Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
189Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
190Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
191Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
192Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
193GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
194Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
195Sub-7-nm textured ZrO2 with giant ferroelectricity
196Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
197Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
198Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
199Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
200Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
201Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
202Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
203Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
204Perspectives on future directions in III-N semiconductor research
205Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
206Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
207AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
208Plasma-enhanced atomic layer deposition of tungsten nitride
209Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
210Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
211Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
212Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
213A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
214Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
215Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
216Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
217Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
218AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
219Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
220Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
221Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
222Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
223Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
224Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
225Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
226Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
227High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
228Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
229Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
230Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
231Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
232Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
233Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
234Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
235Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
236Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
237Design and development of nanoimprint-enabled structures for molecular motor devices
238Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
239Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
240Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
241Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
242Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
243Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
244Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
245Band alignment of Al2O3 with (-201) β-Ga2O3
246Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating