Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Veeco - Ultratech - Cambridge NanoTech Fiji hardware returned 184 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
2A fully integrated electronic platform for multiplexed intermolecular force spectroscopy
3Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
4Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
5ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
6ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
7ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
8ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
9AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
10AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
11AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
12Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
13Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
14Annealing behavior of ferroelectric Si-doped HfO2 thin films
15Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
16Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
17Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
18Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
19Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
20Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
21Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
22Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
23Atomic layer deposition of GaN at low temperatures
24Atomic layer deposition of metal-oxide thin films on cellulose fibers
25Atomic Layer Deposition of the Solid Electrolyte LiPON
26Atomic layer deposition of titanium nitride for quantum circuits
27Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
28Atomic layer epitaxy for quantum well nitride-based devices
29Band alignment of Al2O3 with (-201) β-Ga2O3
30Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
31Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
32Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
33Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
34Biofilm prevention on cochlear implants
35Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
36Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
37Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
38Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
39Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
40Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
41Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
42Damage evaluation in graphene underlying atomic layer deposition dielectrics
43Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
44DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
45Demonstration of flexible thin film transistors with GaN channels
46Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
47Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
48Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
49Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
50Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
51Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
52Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
53Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
54Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
55Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
56Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
57Electrical characteristics of β-Ga2O3 thin films grown by PEALD
58Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
59Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
60Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
61Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
62Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
63Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
64Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
65Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
66Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
67Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
68Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
69Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
70Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
71Fully CMOS-compatible titanium nitride nanoantennas
72GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
73Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
74Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
75Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
76High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
77High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
78Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
79Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
80Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
81Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
82Impact of degradable nanowires on long-term brain tissue responses
83Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
84Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
85Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
86Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
87Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
88Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
89Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
90Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
91Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
92Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
93Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
94Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
95Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
96Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
97Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
98Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
99Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
100Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
101Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
102Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
103Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
104Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
105Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
106Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
107Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
108Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
109Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
110Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
111Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
112Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
113Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
114Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
115Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
116Metal-semiconductor-metal ultraviolet photodetectors based on gallium nitride grown by atomic layer deposition at low temperatures
117Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
118Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
119New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
120Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
121Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
122Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
123Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
124Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
125Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
126Passivation effects of atomic-layer-deposited aluminum oxide
127Perspectives on future directions in III-N semiconductor research
128Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
129Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
130Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
131Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
132Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
133Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
134Plasma-enhanced atomic layer deposition of superconducting niobium nitride
135Plasma-enhanced atomic layer deposition of titanium vanadium nitride
136Plasma-enhanced atomic layer deposition of tungsten nitride
137Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
138Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
139Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
140Programmable on-chip DNA compartments as artificial cells
141Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
142Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
143Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
144Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
145Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
146Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
147Self-Limiting Growth of GaN at Low Temperatures
148Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
149Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
150Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
151Single-Cell Photonic Nanocavity Probes
152Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
153Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
154Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
155Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
156Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
157Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
158Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
159Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
160Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
161Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
162Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
163Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
164Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
165Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
166TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
167Template-assisted synthesis of III-nitride and metal-oxide nano-heterostructures using low-temperature atomic layer deposition for energy, sensing, and catalysis applications (Presentation Recording)
168Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
169The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
170The effects of layering in ferroelectric Si-doped HfO2 thin films
171The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
172The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
173The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
174The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
175The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
176Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
177Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
178Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
179Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
180Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
181Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
182Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
183Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
184Using top graphene layer as sacrificial protection during dielectric atomic layer deposition


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