Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes

Type:
Journal
Info:
ACS Appl. Energy Mater. 2019, 2, 2, 1060-1066
Date:
2019-01-07
DOI:
http://dx.doi.org/10.1021/acsaem.8b01562

Author Information

Name Institution
Thomas R. HellsternStanford University
David W. PalmStanford University
James CarterUniversity of Nevada - Las Vegas (UNLV)
Alex D. DeAngelisUniversity of Hawaii at Manoa
Kimberly HorsleyUniversity of Hawaii at Manoa
Lothar WeinhardtKarlsruhe Institute of Technology (KIT)
Wanli YangStanford University
Monika BlumUniversity of Nevada - Las Vegas (UNLV)
Nicolas GaillardUniversity of Hawaii at Manoa
Clemens HeskeKarlsruhe Institute of Technology (KIT)
Thomas F. JaramilloStanford University

Films

Plasma MoOx

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Molybdenum hexacarbonyl, Mo(CO)6
CAS#: 13939-06-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 165C

Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Magellan XH

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: Varian Cary 6000i UV-Vis-NIR

Characteristic: Optical Absorption
Analysis: UV-VIS Spectroscopy
Diagnostic: Varian Cary 6000i UV-Vis-NIR

Characteristic: Photoelectrochemical (PEC) Activity
Analysis: CV, Cyclic Voltammetry
Diagnostic: -

Characteristic: Damage, Defects
Analysis: Linear Sweep Voltammetry
Diagnostic: -

Substrates

TiO2

Notes

1504