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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells

Type:
Journal
Info:
Applied Physics Letters 108, 113301 (2016)
Date:
2016-03-03

Author Information

Name Institution
David MoermanUniversity of Washington
Hyungchul (GaTech) KimGeorgia Institute of Technology
Adam E. ColbertUniversity of Washington
Samuel GrahamGeorgia Institute of Technology
David S. GingerUniversity of Washington

Films


Film/Plasma Properties

Characteristic: Work Function
Analysis: Scanning Kelvin Probe Microscopy (SKPM)

Characteristic: Lifetime
Analysis: Scanning Kelvin Probe Microscopy (SKPM)

Characteristic: Morphology, Roughness, Topography
Analysis: Scanning Kelvin Probe Microscopy (SKPM)

Substrates

Notes

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