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Sub-7-nm textured ZrO2 with giant ferroelectricity
Type:
Journal
Info:
Acta Materialia 205 (2021) 116536
Date:
2020-11-29
Author Information
| Name | Institution |
|---|---|
| Kuei-Wen Huang | National Taiwan University |
| Sheng-Han Yi | National Taiwan University |
| Yu-Sen Jiang | National Taiwan University |
| Wei-Chung Kao | National Taiwan University |
| Yu-Tung Yin | National Taiwan University |
| David Beck | Asylum Research, an Oxford Instruments Company |
| Vladimir Korolkov | Asylum Research, an Oxford Instruments Company |
| Roger Proksch | Asylum Research, an Oxford Instruments Company |
| Jay Shieh | National Taiwan University |
| Miin-Jang Chen | National Taiwan University |
Films
Plasma ZrO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Ferroelectricity
Analysis: P-V, Polarization-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Piezoelectric properties
Analysis: PFM Piezo Force Microscopy
Substrates
| Pt |
Notes
| 1586 |