Sub-7-nm textured ZrO2 with giant ferroelectricity

Type:
Journal
Info:
Acta Materialia 205 (2021) 116536
Date:
2020-11-29
DOI:
https://doi.org/10.1016/j.actamat.2020.116536

Author Information

Name Institution
Kuei-Wen HuangNational Taiwan University
Sheng-Han YiNational Taiwan University
Yu-Sen JiangNational Taiwan University
Wei-Chung KaoNational Taiwan University
Yu-Tung YinNational Taiwan University
David BeckAsylum Research, an Oxford Instruments Company
Vladimir KorolkovAsylum Research, an Oxford Instruments Company
Roger ProkschAsylum Research, an Oxford Instruments Company
Jay ShiehNational Taiwan University
Miin-Jang ChenNational Taiwan University

Films

Plasma ZrO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Ellipso Technology Elli-SE

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: Ellipso Technology Elli-SE

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: Ellipso Technology Elli-SE

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku TTRAX III

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Helios Nanolab600

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Helios Nanolab600

Characteristic: Ferroelectricity
Analysis: P-V, Polarization-Voltage Measurements
Diagnostic: aixACCT TF 2000

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Diagnostic: Keithley 4200-SCS

Characteristic: Piezoelectric properties
Analysis: PFM Piezo Force Microscopy
Diagnostic: Asylum Research Cypher AFM

Substrates

Pt

Notes

1586