2021 Year in Review

The publication database currently has 1616 entries.

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202 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

250 Film and Plasma Characteristics

88 Theses

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Tailoring angular selectivity in SiO₂ slanted columnar thin films using atomic layer deposition of titanium nitride Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition

Search 1616 plasma ALD publications by:

202 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

250 Film and Plasma Characteristics

Effect of Deposition Method on Valence Band Offsets of SiO₂ and Al₂O₃ on (Al_0.14Ga_0.86)₂O₃

Type:

Journal

Info:

ECS J. Solid State Sci. Technol. 2019 volume 8, issue 7, Q3001-Q3006

Date:

2018-11-24

DOI:

http://dx.doi.org/10.1149/2.0021907jss

Author Information

Name	Institution
Chaker Fares	University of Florida
Fan Ren	University of Florida
David Hays	University of Florida
Brent P. Gila	University of Florida
S. J. Pearton	University of Florida

Films

Plasma SiO₂

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji

3DMASi, (Me₂N)₃SiH, [(CH₃)₂N]₃SiH, Tris(DiMethylAmido) Silane

CAS#: 15112-89-7

Where to buy precursor

CAS#: 7782-44-7

Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities

Analysis: XPS, X-ray Photoelectron Spectroscopy

Diagnostic: Physical Electronics PHI 5100 ESCA

Characteristic: Valence Band

Analysis: XPS, X-ray Photoelectron Spectroscopy

Diagnostic: Physical Electronics PHI 5100 ESCA

Characteristic: Band Gap

Analysis: REELS, Reflection Electron Energy Loss Spectroscopy

Diagnostic: -

Substrates

AlGaO

Keywords

Notes

1220