David Hays Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by David Hays returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
2Band alignment of Al2O3 with (-201) β-Ga2O3
3High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
4GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
5Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
6Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
7Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
8Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3