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David Hays Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by David Hays returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
2Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
3High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
4Band alignment of Al2O3 with (-201) β-Ga2O3
5Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
6Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
7GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
8Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3