Publication Information

Title:
Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 35, 011206 (2017)
Date:
2016-12-27

Author Information

Name Institution
David HaysUniversity of Florida
Brent P. GilaUniversity of Florida
S. J. PeartonUniversity of Florida
Andres TruccoUniversity of Florida
Ryan ThorpeRutgers University
Wei RenUniversity of Florida

Films




Film/Plasma Properties

Characteristic: Valence Band
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy

Characteristic: Band Gap
Analysis: REELS, Reflection Electron Energy Loss Spectroscopy

Substrates

IGZO
Quartz

Keywords

Notes

Tested if starting with HfO2 or SiO2 impacted results.
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