3DMAS, Tris(DiMethylAmido)Silane, CAS# 15112-89-7

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2	Strem Chemicals, Inc.	Tris(dimethylamino)silane, 99+%
3	Ereztech	Tris(dimethylamino)silane (99.8%-Si)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 56 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
2	Composite materials and nanoporous thin layers made by atomic layer deposition
3	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
5	Annealing behavior of ferroelectric Si-doped HfO2 thin films
6	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
7	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
8	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
9	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
10	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
11	Optical properties and bandgap evolution of ALD HfSiOx films
12	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
13	The effects of layering in ferroelectric Si-doped HfO2 thin films
14	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
15	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
16	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
17	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
18	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
19	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
20	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
21	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
22	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
23	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
24	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
25	Atomic layer deposition of metal-oxide thin films on cellulose fibers
26	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
27	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
28	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
29	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
30	Comparative study of ALD SiO2 thin films for optical applications
31	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
32	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
33	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
34	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
35	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
36	High-Reflective Coatings For Ground and Space Based Applications
37	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
38	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
39	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
40	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
41	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
42	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
43	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
44	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
45	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
46	Optical properties and bandgap evolution of ALD HfSiOx films
47	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
48	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
49	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
50	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
51	Single-Cell Photonic Nanocavity Probes
52	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
53	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
54	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
55	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
56	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction

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