3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
4EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
5Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
2Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
3Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
4Optical properties and bandgap evolution of ALD HfSiOx films
5Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
6Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
7Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
8Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
9Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
10Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
11Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
12Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
13TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
14Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
15Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
16Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
17Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
18Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
19Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
20Atomic layer deposition of metal-oxide thin films on cellulose fibers
21Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
223D structure evolution using metastable atomic layer deposition based on planar silver templates
23Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
24Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
25Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
26Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
27Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
28Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
29Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
30Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
31Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
32Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
33Composite materials and nanoporous thin layers made by atomic layer deposition
34Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
35Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
36Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
37Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
38Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
39Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
40An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
41Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
42Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
43Optical properties and bandgap evolution of ALD HfSiOx films
44Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
45Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
46Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
47Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
48Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
49HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
50Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
51Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
52Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
53Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
54Single-Cell Photonic Nanocavity Probes
55Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
56Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
57Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
58High-Reflective Coatings For Ground and Space Based Applications
59Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
60Comparative study of ALD SiO2 thin films for optical applications
61Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
62Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
63Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
64Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
65Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
66Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
67The effects of layering in ferroelectric Si-doped HfO2 thin films
68Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
69Annealing behavior of ferroelectric Si-doped HfO2 thin films
70Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
71Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells