3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
2EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
3GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
6Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
2Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
3Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
4Composite materials and nanoporous thin layers made by atomic layer deposition
5Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
6Comparative study of ALD SiO2 thin films for optical applications
7Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
8Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
9Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
103D structure evolution using metastable atomic layer deposition based on planar silver templates
11Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
12Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
13Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
14Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
15Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
16The effects of layering in ferroelectric Si-doped HfO2 thin films
17Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
18Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
19Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
20Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
21Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
22Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
23Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
24Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
25Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
26High-Reflective Coatings For Ground and Space Based Applications
27Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
28Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
29Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
30An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
31Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
32Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
33Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
34Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
35Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
36Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
37Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
38Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
39Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
40Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
41Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
42Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
43Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
44Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
45Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
46Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
47Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
48HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
49Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
50Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
51Single-Cell Photonic Nanocavity Probes
52Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
53Annealing behavior of ferroelectric Si-doped HfO2 thin films
54Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
55Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
56Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
57Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
58Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
59Optical properties and bandgap evolution of ALD HfSiOx films
60Atomic layer deposition of metal-oxide thin films on cellulose fibers
61Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
62Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
63Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
64Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
65TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
66Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
67Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
68Optical properties and bandgap evolution of ALD HfSiOx films
69Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
70Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
71Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction