3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
4GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
6EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
2Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
3Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
4Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
5Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
6Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
7Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
8Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
9Optical properties and bandgap evolution of ALD HfSiOx films
10Optical properties and bandgap evolution of ALD HfSiOx films
11Annealing behavior of ferroelectric Si-doped HfO2 thin films
12Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
13Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
14Comparative study of ALD SiO2 thin films for optical applications
15Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
16Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
17Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
18Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
19Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
20Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
21Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
22Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
23Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
24Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
25Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
26High-Reflective Coatings For Ground and Space Based Applications
27Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
28Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
29Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
30Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
31Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
32Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
33Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
34Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
35Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
36Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
37Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
38Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
39Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
40Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
41Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
42Atomic layer deposition of metal-oxide thin films on cellulose fibers
43TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
44Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
45Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
46Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
47Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
483D structure evolution using metastable atomic layer deposition based on planar silver templates
49Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
50Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
51Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
52Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
53Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
54Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
55Single-Cell Photonic Nanocavity Probes
56Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
57Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
58Composite materials and nanoporous thin layers made by atomic layer deposition
59Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
60Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
61An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
62Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
63Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
64Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
65Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
66Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
67Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
68HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
69Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
70The effects of layering in ferroelectric Si-doped HfO2 thin films
71Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4