3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
5EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
6Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
2Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
3Optical properties and bandgap evolution of ALD HfSiOx films
4Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
5Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
6Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
7Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
8Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
9Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
10Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
11Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
12Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
13An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
14Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
15Annealing behavior of ferroelectric Si-doped HfO2 thin films
16Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
17TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
18Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
19Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
20HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
21High-Reflective Coatings For Ground and Space Based Applications
22Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
23Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
24Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
25Single-Cell Photonic Nanocavity Probes
26Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
27Atomic layer deposition of metal-oxide thin films on cellulose fibers
28Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
29Comparative study of ALD SiO2 thin films for optical applications
30Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
31Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
32Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
33Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
34Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
35Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
36Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
37Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
38Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
39Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
403D structure evolution using metastable atomic layer deposition based on planar silver templates
41Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
42Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
43Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
44Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
45Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
46Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
47Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
48Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
49Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
50Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
51Optical properties and bandgap evolution of ALD HfSiOx films
52Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
53Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
54Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
55Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
56Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
57Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
58Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
59Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
60Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
61Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
62Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
63Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
64Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
65Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
66The effects of layering in ferroelectric Si-doped HfO2 thin films
67Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
68Composite materials and nanoporous thin layers made by atomic layer deposition
69Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
70Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
71Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires