3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
5GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
2Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
3Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
4Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
5Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
6Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
7Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
8Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
93D structure evolution using metastable atomic layer deposition based on planar silver templates
10Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
11Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
12Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
13Single-Cell Photonic Nanocavity Probes
14Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
15Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
16Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
17Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
18Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
19Comparative study of ALD SiO2 thin films for optical applications
20Annealing behavior of ferroelectric Si-doped HfO2 thin films
21Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
22Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
23Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
24Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
25Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
26Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
27Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
28Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
29Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
30Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
31Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
32Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
33Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
34Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
35Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
36Atomic layer deposition of metal-oxide thin films on cellulose fibers
37Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
38Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
39Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
40Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
41Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
42Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
43An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
44TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
45Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
46Optical properties and bandgap evolution of ALD HfSiOx films
47Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
48Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
49The effects of layering in ferroelectric Si-doped HfO2 thin films
50Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
51HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
52Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
53Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
54Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
55Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
56Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
57Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
58Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
59Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
60Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
61Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
62Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
63Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
64High-Reflective Coatings For Ground and Space Based Applications
65Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
66Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
67Composite materials and nanoporous thin layers made by atomic layer deposition
68Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
69Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
70Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
71Optical properties and bandgap evolution of ALD HfSiOx films