3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
2EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
4Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
6DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
2Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
3Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
4The effects of layering in ferroelectric Si-doped HfO2 thin films
5An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
6Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
7Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
8Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
9Comparative study of ALD SiO2 thin films for optical applications
10Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
11Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
12Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
13Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
14Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
15Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
16Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
17Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
18Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
19TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
20Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
21Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
22Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
23Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
243D structure evolution using metastable atomic layer deposition based on planar silver templates
25Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
26Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
27Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
28Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
29Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
30Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
31Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
32Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
33Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
34Single-Cell Photonic Nanocavity Probes
35Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
36Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
37Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
38Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
39Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
40Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
41Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
42High-Reflective Coatings For Ground and Space Based Applications
43Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
44Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
45Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
46Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
47Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
48Atomic layer deposition of metal-oxide thin films on cellulose fibers
49Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
50Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
51Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
52Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
53Composite materials and nanoporous thin layers made by atomic layer deposition
54Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
55Annealing behavior of ferroelectric Si-doped HfO2 thin films
56Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
57Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
58Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
59Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
60Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
61Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
62Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
63Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
64Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
65Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
66Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
67Optical properties and bandgap evolution of ALD HfSiOx films
68Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
69HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
70Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
71Optical properties and bandgap evolution of ALD HfSiOx films