3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
2Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
3GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
2Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
3Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
4The effects of layering in ferroelectric Si-doped HfO2 thin films
5Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
6Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
7Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
8Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
9Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
10Atomic layer deposition of metal-oxide thin films on cellulose fibers
11Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
12Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
13Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
14Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
15Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
16Annealing behavior of ferroelectric Si-doped HfO2 thin films
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
19Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
20Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
21Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
22Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
23Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
24Optical properties and bandgap evolution of ALD HfSiOx films
25Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
26Composite materials and nanoporous thin layers made by atomic layer deposition
27Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
283D structure evolution using metastable atomic layer deposition based on planar silver templates
29Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
30Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
31Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
32Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
33Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
34High-Reflective Coatings For Ground and Space Based Applications
35Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
36Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
37Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
38Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
39Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
40Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
41Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
42Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
43Single-Cell Photonic Nanocavity Probes
44Optical properties and bandgap evolution of ALD HfSiOx films
45Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
46Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
47Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
48Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
49Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
50Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
51Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
52Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
53Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
54Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
55Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
56Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
57Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
58Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
59Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
60HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
61Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
62Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
63TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
64An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
65Comparative study of ALD SiO2 thin films for optical applications
66Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
67Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
68Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
69Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
70Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
71Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride