3DMAS, Tris(DiMethylAmido)Silane, CAS# 15112-89-7

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Tris(dimethylamino)silane, 99+%
2	Strem Chemicals, Inc.	Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 47 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
2	Composite materials and nanoporous thin layers made by atomic layer deposition
3	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
5	Annealing behavior of ferroelectric Si-doped HfO2 thin films
6	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
7	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
8	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
9	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
10	Optical properties and bandgap evolution of ALD HfSiOx films
11	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
12	The effects of layering in ferroelectric Si-doped HfO2 thin films
13	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
14	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
15	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
16	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
17	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
18	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
19	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
20	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
21	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
22	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
23	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
24	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
25	Comparative study of ALD SiO2 thin films for optical applications
26	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
27	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
28	High-Reflective Coatings For Ground and Space Based Applications
29	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
30	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
31	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
32	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
33	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
34	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
35	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
36	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
37	Optical properties and bandgap evolution of ALD HfSiOx films
38	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
39	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
40	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
41	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
42	Single-Cell Photonic Nanocavity Probes
43	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
44	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
45	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
46	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
47	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction

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