3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸Tris(dimethylamino) silane
2Strem Chemicals, Inc.🇺🇸Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
3Gelest🇺🇸Tris(Dimethylamino)Silane
4Strem Chemicals, Inc.🇺🇸Tris(dimethylamino)silane, 99+%
5DOCK/CHEMICALS🇩🇪Tris(dimethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 70 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
2Composite materials and nanoporous thin layers made by atomic layer deposition
3Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
5Annealing behavior of ferroelectric Si-doped HfO2 thin films
6Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
7Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
8Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
9Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
10Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
11Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
12Optical properties and bandgap evolution of ALD HfSiOx films
13TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
14The effects of layering in ferroelectric Si-doped HfO2 thin films
15Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
16Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
17Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
18Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
19Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
20Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
21Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
22Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
233D structure evolution using metastable atomic layer deposition based on planar silver templates
24Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
25Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
26Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
27An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
28Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
29Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
30Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
31Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
32Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
33Atomic layer deposition of metal-oxide thin films on cellulose fibers
34Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
35Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
36Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
37Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
38Comparative study of ALD SiO2 thin films for optical applications
39Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
40Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
41Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
42Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
43Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
44Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
45HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
46High-Reflective Coatings For Ground and Space Based Applications
47Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
48Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
49Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
50Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
51Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
52Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
53Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
54Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
55Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
56Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
57Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
58Optical properties and bandgap evolution of ALD HfSiOx films
59Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
60Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
61Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
62Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
63Single-Cell Photonic Nanocavity Probes
64Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
65Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
66Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
67Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
68Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
69Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
70Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction