3DMASi, (Me₂N)₃SiH, [(CH₃)₂N]₃SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2	Gelest	Tris(Dimethylamino)Silane
3	Strem Chemicals, Inc.	Tris(dimethylamino)silane, 99+%
4	Ereztech	Tris(dimethylamino)silane (99.8%-Si)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 59 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
2	Composite materials and nanoporous thin layers made by atomic layer deposition
3	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
5	Annealing behavior of ferroelectric Si-doped HfO2 thin films
6	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
7	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
8	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
9	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
10	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
11	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
12	Optical properties and bandgap evolution of ALD HfSiOx films
13	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
14	The effects of layering in ferroelectric Si-doped HfO2 thin films
15	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
16	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
17	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
18	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
19	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
20	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
21	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
22	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
23	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
24	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
25	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
26	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
27	Atomic layer deposition of metal-oxide thin films on cellulose fibers
28	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
29	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
30	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
31	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
32	Comparative study of ALD SiO2 thin films for optical applications
33	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
34	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
35	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
36	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
37	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
38	High-Reflective Coatings For Ground and Space Based Applications
39	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
40	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
41	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
42	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
43	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
44	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
45	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
46	Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
47	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
48	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
49	Optical properties and bandgap evolution of ALD HfSiOx films
50	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
51	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
52	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
53	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
54	Single-Cell Photonic Nanocavity Probes
55	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
56	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
57	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
58	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
59	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction

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