3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2Gelest🇺🇸Tris(Dimethylamino)Silane
3DOCK/CHEMICALS🇩🇪Tris(dimethylamino)silane
4Strem Chemicals, Inc.🇺🇸Tris(dimethylamino)silane, 99+%
5Ereztech🇺🇸Tris(dimethylamino) silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
2Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
3Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
4The effects of layering in ferroelectric Si-doped HfO2 thin films
5High-Reflective Coatings For Ground and Space Based Applications
6Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
7Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
8Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
9Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
10Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
11Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
12Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
13Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
14Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
15Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
16Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
17Atomic layer deposition of metal-oxide thin films on cellulose fibers
18TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
19Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
20Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
21Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
22Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
23Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
24Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
25Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
26Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
27Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
28Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
29Composite materials and nanoporous thin layers made by atomic layer deposition
30Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
31Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
32Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
33Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
34Optical properties and bandgap evolution of ALD HfSiOx films
35Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
36Annealing behavior of ferroelectric Si-doped HfO2 thin films
37Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
38Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
39Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
40Optical properties and bandgap evolution of ALD HfSiOx films
41Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
42Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
43Comparative study of ALD SiO2 thin films for optical applications
44Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
45Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
46An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
47Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
48Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
49Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
50Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
51Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
52Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
53Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
54Single-Cell Photonic Nanocavity Probes
55HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
56Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
57Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
58Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
59Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
60Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
61Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
62Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
633D structure evolution using metastable atomic layer deposition based on planar silver templates
64Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
65Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
66Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
67Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
68Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
69Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
70Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
71Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition