3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
4Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
5DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
6GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Optical properties and bandgap evolution of ALD HfSiOx films
2Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
3Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
4Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
5Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
6Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
7Composite materials and nanoporous thin layers made by atomic layer deposition
8Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
9Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
10Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
11Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
12Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
13Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
14Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
15Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
16Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
17The effects of layering in ferroelectric Si-doped HfO2 thin films
18Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
19Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
20Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
21Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
22Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
23Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
24Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
25Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
26HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
27Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
28Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
29Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
30Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
31Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
32Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
33Single-Cell Photonic Nanocavity Probes
34Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
35Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
36Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
37Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
38Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
39Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
40Annealing behavior of ferroelectric Si-doped HfO2 thin films
41Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
42Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
43Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
44Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
45Atomic layer deposition of metal-oxide thin films on cellulose fibers
46Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
47Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
48An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
49Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
50Comparative study of ALD SiO2 thin films for optical applications
51Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
52Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
53Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
54Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
55Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
56Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
57Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
58High-Reflective Coatings For Ground and Space Based Applications
59Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
60Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
61Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
62Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
63Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
64TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
65Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
66Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
673D structure evolution using metastable atomic layer deposition based on planar silver templates
68Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
69Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
70Optical properties and bandgap evolution of ALD HfSiOx films
71Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current