3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
2GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
5Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
6EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
2Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
3Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
4Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
5Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
6Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
7Optical properties and bandgap evolution of ALD HfSiOx films
8Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
9Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
10Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
11Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
12Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
13Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
143D structure evolution using metastable atomic layer deposition based on planar silver templates
15Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
16Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
17Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
18Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
19Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
20Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
21HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
22Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
23Comparative study of ALD SiO2 thin films for optical applications
24Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
25Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
26Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
27Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
28Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
29Optical properties and bandgap evolution of ALD HfSiOx films
30Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
31Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
32An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
33Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
34Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
35Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
36Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
37Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
38Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
39Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
40Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
41Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
42Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
43Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
44Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
45Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
46Single-Cell Photonic Nanocavity Probes
47Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
48Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
49Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
50Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
51Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
52Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
53High-Reflective Coatings For Ground and Space Based Applications
54The effects of layering in ferroelectric Si-doped HfO2 thin films
55Annealing behavior of ferroelectric Si-doped HfO2 thin films
56Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
57Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
58Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
59Composite materials and nanoporous thin layers made by atomic layer deposition
60Atomic layer deposition of metal-oxide thin films on cellulose fibers
61Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
62Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
63TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
64Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
65Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
66Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
67Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
68Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
69Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
70Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
71Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes