3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
4EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
6GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
2Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
3Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
4Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
5Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
6Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
7Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
8Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
9Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
10Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
11TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
12Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
13High-Reflective Coatings For Ground and Space Based Applications
14Annealing behavior of ferroelectric Si-doped HfO2 thin films
15Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
16Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
17Single-Cell Photonic Nanocavity Probes
18Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
19Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
20Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
21Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
22Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
23Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
24Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
25Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
26Optical properties and bandgap evolution of ALD HfSiOx films
27Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
28Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
29The effects of layering in ferroelectric Si-doped HfO2 thin films
30Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
31Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
32Comparative study of ALD SiO2 thin films for optical applications
33Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
34Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
35Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
36Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
37Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
38Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
39An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
40Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
41Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
42Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
43Atomic layer deposition of metal-oxide thin films on cellulose fibers
44Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
45Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
46Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
47Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
48Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
49Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
50Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
51Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
52Composite materials and nanoporous thin layers made by atomic layer deposition
53Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
54Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
55Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
56Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
57Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
58HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
59Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
60Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
61Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
62Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
63Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
64Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
65Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
66Optical properties and bandgap evolution of ALD HfSiOx films
67Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
68Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
693D structure evolution using metastable atomic layer deposition based on planar silver templates
70Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
71Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires