3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
2Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
5GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
6EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
2Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
3Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
4Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
5Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
6Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
7Atomic layer deposition of metal-oxide thin films on cellulose fibers
8Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
9HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
10Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
11The effects of layering in ferroelectric Si-doped HfO2 thin films
12Annealing behavior of ferroelectric Si-doped HfO2 thin films
13Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
14Single-Cell Photonic Nanocavity Probes
15Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
16Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
17Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
18Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
19Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
20Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
21Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
22Composite materials and nanoporous thin layers made by atomic layer deposition
23Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
24Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
25Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
26Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
27Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
28Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
29Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
30Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
31Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
32Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
33Optical properties and bandgap evolution of ALD HfSiOx films
34Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
35Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
36Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
37Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
38Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
39Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
40Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
41Optical properties and bandgap evolution of ALD HfSiOx films
42Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
43Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
44An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
45Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
46Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
47Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
48Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
49Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
50Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
51Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
52Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
53TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
54Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
55Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
56Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
57Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
58Comparative study of ALD SiO2 thin films for optical applications
59Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
60High-Reflective Coatings For Ground and Space Based Applications
61Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
62Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
63Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
64Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
65Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
66Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
673D structure evolution using metastable atomic layer deposition based on planar silver templates
68Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
69Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
70Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
71Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction