3DMAS, Tris(DiMethylAmido)Silane, CAS# 15112-89-7

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2Strem Chemicals, Inc.Tris(dimethylamino)silane, 99+%
3EreztechTris(dimethylamino)silane (99.8%-Si)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 56 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
2Composite materials and nanoporous thin layers made by atomic layer deposition
3Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
5Annealing behavior of ferroelectric Si-doped HfO2 thin films
6Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
7Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
8Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
9Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
10Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
11Optical properties and bandgap evolution of ALD HfSiOx films
12TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
13The effects of layering in ferroelectric Si-doped HfO2 thin films
14Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
15Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
16Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
17Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
18Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
19Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
20Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
21Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
22Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
23Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
24Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
25Atomic layer deposition of metal-oxide thin films on cellulose fibers
26Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
27Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
28Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
29Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
30Comparative study of ALD SiO2 thin films for optical applications
31Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
32Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
33Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
34Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
35Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
36High-Reflective Coatings For Ground and Space Based Applications
37Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
38Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
39Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
40Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
41Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
42Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
43Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
44Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
45Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
46Optical properties and bandgap evolution of ALD HfSiOx films
47Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
48Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
49Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
50Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
51Single-Cell Photonic Nanocavity Probes
52Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
53Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
54Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
55Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
56Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction


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