Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
4EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
5GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
6DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-Reflective Coatings For Ground and Space Based Applications
2Composite materials and nanoporous thin layers made by atomic layer deposition
3Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
4Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
5Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
6TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
7Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
8Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
9Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
10Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
11Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
12The effects of layering in ferroelectric Si-doped HfO2 thin films
13Comparative study of ALD SiO2 thin films for optical applications
14Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
15Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
16Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
17Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
18Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
19Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
20Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
21Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
223D structure evolution using metastable atomic layer deposition based on planar silver templates
23HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
24Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
25Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
26Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
27Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
28Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
29Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
30Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
31Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
32Optical properties and bandgap evolution of ALD HfSiOx films
33Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
34Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
35Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
36Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
37Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
38Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
39Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
40Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
41An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
42Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
43Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
44Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
45Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
46Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
47Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
48Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
49Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
50Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
51Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
52Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
53Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
54Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
55Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
56Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
57Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
58Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
59Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
60Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
61Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
62Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
63Annealing behavior of ferroelectric Si-doped HfO2 thin films
64Atomic layer deposition of metal-oxide thin films on cellulose fibers
65Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
66Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
67Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
68Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
69Optical properties and bandgap evolution of ALD HfSiOx films
70Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
71Single-Cell Photonic Nanocavity Probes