3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
4GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
5DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
2Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
3Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
4Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
5Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
6Single-Cell Photonic Nanocavity Probes
7Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
8Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
9Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
10Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
11Comparative study of ALD SiO2 thin films for optical applications
12Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
13The effects of layering in ferroelectric Si-doped HfO2 thin films
14Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
15Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
16Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
17Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
18Atomic layer deposition of metal-oxide thin films on cellulose fibers
19Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
20Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
21Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
22Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
23Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
24An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
25Annealing behavior of ferroelectric Si-doped HfO2 thin films
26Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
27Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
28Optical properties and bandgap evolution of ALD HfSiOx films
29Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
30HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
31Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
32Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
33Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
34Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
35Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
36Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
37Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
38Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
39TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
40Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
41Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
42Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
43Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
44Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
45Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
46Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
47Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
48Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
49Composite materials and nanoporous thin layers made by atomic layer deposition
50Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
51Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
52Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
53Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
54Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
55Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
56High-Reflective Coatings For Ground and Space Based Applications
57Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
58Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
59Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
60Optical properties and bandgap evolution of ALD HfSiOx films
61Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
62Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
63Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
64Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
65Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
66Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
67Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
68Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
693D structure evolution using metastable atomic layer deposition based on planar silver templates
70Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
71Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes