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3DMAS, Tris(DiMethylAmido)Silane, CAS# 15112-89-7

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Tris(dimethylamino)silane, 99+%
2Strem Chemicals, Inc.Tris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 47 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
2Composite materials and nanoporous thin layers made by atomic layer deposition
3Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
4Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
5Annealing behavior of ferroelectric Si-doped HfO2 thin films
6Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
7Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
8Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
9Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
10Optical properties and bandgap evolution of ALD HfSiOx films
11TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
12The effects of layering in ferroelectric Si-doped HfO2 thin films
13Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
14Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
15Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
16Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
17Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
18Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
19Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
20Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
21Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
22Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
23Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
24Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
25Comparative study of ALD SiO2 thin films for optical applications
26Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
27Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
28High-Reflective Coatings For Ground and Space Based Applications
29Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
30Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
31Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
32Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
33Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
34Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
35Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
36Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
37Optical properties and bandgap evolution of ALD HfSiOx films
38Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
39Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
40Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
41Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
42Single-Cell Photonic Nanocavity Probes
43Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
44Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
45Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
46Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
47Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction

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