3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD
2Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
3GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
5EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Single-Cell Photonic Nanocavity Probes
2Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
3Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
4Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
5Atomic layer deposition of metal-oxide thin films on cellulose fibers
6Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
7Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
8Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
9Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
10Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
11Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
12Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
13Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
14Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
15Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
16Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
17Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
18Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
19Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
20Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
21Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
22Comparative study of ALD SiO2 thin films for optical applications
23Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
24Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
25Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
26TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
27Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
28Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
29Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
30Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
31Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
32Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
33Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
34HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
35Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
36Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
37Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
38Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
39Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
40Optical properties and bandgap evolution of ALD HfSiOx films
41Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
42Composite materials and nanoporous thin layers made by atomic layer deposition
43Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
44Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
45Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
46Optical properties and bandgap evolution of ALD HfSiOx films
47Annealing behavior of ferroelectric Si-doped HfO2 thin films
48Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
493D structure evolution using metastable atomic layer deposition based on planar silver templates
50High-Reflective Coatings For Ground and Space Based Applications
51Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
52The effects of layering in ferroelectric Si-doped HfO2 thin films
53Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
54Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
55Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
56Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
57Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
58Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
59Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
60Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
61Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
62An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
63Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
64Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
65Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
66Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
67Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
68Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
69Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
70Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
71Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3