3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%
2EreztechπŸ‡ΊπŸ‡ΈTris(dimethylamino) silane
3DOCK/CHEMICALSπŸ‡©πŸ‡ͺTris(dimethylamino)silane
4GelestπŸ‡ΊπŸ‡ΈTris(Dimethylamino)Silane
5Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(dimethylamino)silane
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(dimethylamino)silane, 99+%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
2Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
3Comparative study of ALD SiO2 thin films for optical applications
4Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
5Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
6Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
7Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
8Optical properties and bandgap evolution of ALD HfSiOx films
9Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
10Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
11High-Reflective Coatings For Ground and Space Based Applications
12Optical properties and bandgap evolution of ALD HfSiOx films
13Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
14Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
15Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
16Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
17Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
18Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ Ξ²-Ga2O3
19Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
20Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
21Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
22Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
23TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
24Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
25Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
26Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
27Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
28Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
29Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
30Single-Cell Photonic Nanocavity Probes
31Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
32Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
33Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
34Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
35Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
36Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
37Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
38Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
39Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
40Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
41The effects of layering in ferroelectric Si-doped HfO2 thin films
42Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and Ξ²-Ga2O3 (2̅01)
43Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
44Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
45Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
46Atomic layer deposition of metal-oxide thin films on cellulose fibers
47Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
48Annealing behavior of ferroelectric Si-doped HfO2 thin films
493D structure evolution using metastable atomic layer deposition based on planar silver templates
50Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
51Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
52Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
53An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
54Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
55Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
56Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
57Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
58Composite materials and nanoporous thin layers made by atomic layer deposition
59HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
60Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
61Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
62Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
63Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
64Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
65Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
66Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
67Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
68Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
69Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
70Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
71Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors