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Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes

Type:
Journal
Info:
Journal of The Electrochemical Society, 165 (16) H1028-H1039
Date:
2018-10-19
DOI:
http://dx.doi.org/10.1149/2.0291816jes

Author Information

Name Institution
Daniel SharonUniversity of Chicago
Peter BenningtonUniversity of Chicago
Claire LiuUniversity of Chicago
Yu KambeUniversity of Chicago
Ban Xuan DongUniversity of Chicago
Veronica F. BurnettUniversity of Chicago
Moshe DolejsiUniversity of Chicago
Garrett GrockeUniversity of Chicago
Shrayesh N. PatelUniversity of Chicago
Paul F. NealeyUniversity of Chicago

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Thermal Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Savannah
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range N/A

Thermal TiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Savannah
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Au
SiO2

Notes

1425