Publication Information

Title: Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes

Type: Journal

Info: Journal of Applied Physics 116, 024508 (2014)

Date: 2014-06-02

DOI: http://dx.doi.org/10.1063/1.4889798

Author Information

Name

Institution

Oregon State University

Intel Corporation

Intel Corporation

Oregon State University

Oregon State University

Oregon State University

Films

Deposition Temperature Range N/A

3236-82-6

7732-18-5

Deposition Temperature Range N/A

6074-84-6

7732-18-5

Deposition Temperature Range N/A

175923-04-3

7732-18-5

Deposition Temperature Range N/A

352535-01-4

7732-18-5

Deposition Temperature Range N/A

75-24-1

7732-18-5

Deposition Temperature Range N/A

15112-89-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Band Gap

REELS, Reflection Electron Energy Loss Spectroscopy

-

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

-

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

I-V Plots

I-V, Current-Voltage Measurements

Agilent 4156B

Band Defects

REELS, Reflection Electron Energy Loss Spectroscopy

-

Substrates

ZCAN (ZrCuAlNi)

Keywords

MIM Diode

Notes

No annealing to avoid crystallization of ALD films or ZCAN substrate.

136



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